Comparison of quartz and silicon as a master mold substrate for patterned media UV-NIL replica process

Morihisa Hoga, Kimio Itoh, Mikio Ishikawa, Naoko Kuwahara, Masaharu Fukuda, Nobuhito Toyama, Syuhei Kurokawa, Toshiro Doi

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Nanoimprint lithography (NIL) is a promising candidate technology to fabricate patterned media for the next generation hard disk drives (HDD). The requirement of pattern pitch for the HDD or discrete-track recording (DTR) media will be as small as from 40 to 50 nm by 2011 or 2012. However not only to create such fine pitch but also long e-beam writing time such as 1 week with conventional high resolution resist ZEP520A are critical. This paper addresses the fabrication processes to combine silicon substrate and a new chemically amplified resist (CAR) for the master molds of this NIL. The e-beam writing speed with this new CAR was achieved over 3-times faster while 50 nm fine DTR patterns were demonstrated with rotary stage e-beam writer. Furthermore, the replication with J-FIL from the master mold into quartz working mold was also demonstrated.

Original languageEnglish
Pages (from-to)1975-1977
Number of pages3
JournalMicroelectronic Engineering
Volume88
Issue number8
DOIs
Publication statusPublished - Aug 1 2011

Fingerprint

Nanoimprint lithography
Quartz
Hard disk storage
Silicon
replicas
lithography
quartz
Molds
silicon
Substrates
recording
Fabrication
requirements
fabrication
high resolution

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

Cite this

Hoga, M., Itoh, K., Ishikawa, M., Kuwahara, N., Fukuda, M., Toyama, N., ... Doi, T. (2011). Comparison of quartz and silicon as a master mold substrate for patterned media UV-NIL replica process. Microelectronic Engineering, 88(8), 1975-1977. https://doi.org/10.1016/j.mee.2010.12.122

Comparison of quartz and silicon as a master mold substrate for patterned media UV-NIL replica process. / Hoga, Morihisa; Itoh, Kimio; Ishikawa, Mikio; Kuwahara, Naoko; Fukuda, Masaharu; Toyama, Nobuhito; Kurokawa, Syuhei; Doi, Toshiro.

In: Microelectronic Engineering, Vol. 88, No. 8, 01.08.2011, p. 1975-1977.

Research output: Contribution to journalArticle

Hoga, Morihisa ; Itoh, Kimio ; Ishikawa, Mikio ; Kuwahara, Naoko ; Fukuda, Masaharu ; Toyama, Nobuhito ; Kurokawa, Syuhei ; Doi, Toshiro. / Comparison of quartz and silicon as a master mold substrate for patterned media UV-NIL replica process. In: Microelectronic Engineering. 2011 ; Vol. 88, No. 8. pp. 1975-1977.
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