Comparison of quartz and silicon as a master mold substrate for patterned media UV-NIL replica process

Morihisa Hoga, Kimio Itoh, Mikio Ishikawa, Naoko Kuwahara, Masaharu Fukuda, Nobuhito Toyama, Syuhei Kurokawa, Toshiro Doi

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

Nanoimprint lithography (NIL) is a promising candidate technology to fabricate patterned media for the next generation hard disk drives (HDD). The requirement of pattern pitch for the HDD or discrete-track recording (DTR) media will be as small as from 40 to 50 nm by 2011 or 2012. However not only to create such fine pitch but also long e-beam writing time such as 1 week with conventional high resolution resist ZEP520A are critical. This paper addresses the fabrication processes to combine silicon substrate and a new chemically amplified resist (CAR) for the master molds of this NIL. The e-beam writing speed with this new CAR was achieved over 3-times faster while 50 nm fine DTR patterns were demonstrated with rotary stage e-beam writer. Furthermore, the replication with J-FIL from the master mold into quartz working mold was also demonstrated.

Original languageEnglish
Pages (from-to)1975-1977
Number of pages3
JournalMicroelectronic Engineering
Volume88
Issue number8
DOIs
Publication statusPublished - Aug 1 2011

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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