Comparison of reactor performance in the nonthermal plasma chemical processing of hazardous air pollutants

Shigeru Futamura, Hisahiro Einaga, Aihua Zhang

Research output: Contribution to journalConference article

10 Citations (Scopus)

Abstract

The performances of three different types of plasma reactors such as ferroelectric packed-bed (FPB), pulsed corona (PCR), and silent discharge (SDP) were compared in the decomposition of trichloroethylene (Cl2C=CHCl, TCE), bromomethane (CH3Br), and tetrafluoromethane (CF4). Irrespective of reactors, HAP reactivity decreased in the order: TCE > CH3Br > CF4. Similar byproducts were obtained with any of the above reactors, and similar trends were observed in the HAP decomposition rate-retarding effect by gaseous oxygen and water. In the TCE decomposition, PCR was extremely effective and 1,000 ppm of TCE almost completely decomposed in dry nitrogen at 0.09 s of residence time, but its performance went down in the CH3Br decomposition. Comparable performances were observed for FPB and SDP, and CF4 conversions were little higher with SDP than with FPB at the same specific energy densities.

Original languageEnglish
Pages (from-to)1105-1110
Number of pages6
JournalConference Record - IAS Annual Meeting (IEEE Industry Applications Society)
Volume2
Publication statusPublished - Dec 1 1999
Externally publishedYes
EventProceedings of the 1999 IEEE Industry Applications Conference - 34th IAS Annual Meeting - Phoenix, AZ, USA
Duration: Oct 3 1999Oct 7 1999

Fingerprint

trichloroethylene
Packed beds
Ferroelectric materials
Decomposition
Plasmas
plasma
decomposition
Processing
Air
corona
Trichloroethylene
Byproducts
residence time
Nitrogen
Oxygen
reactor
comparison
air pollutant
chemical
oxygen

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

Cite this

Comparison of reactor performance in the nonthermal plasma chemical processing of hazardous air pollutants. / Futamura, Shigeru; Einaga, Hisahiro; Zhang, Aihua.

In: Conference Record - IAS Annual Meeting (IEEE Industry Applications Society), Vol. 2, 01.12.1999, p. 1105-1110.

Research output: Contribution to journalConference article

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