Complementary exposure of 70 nm SoC devices in electron projection lithography

Hiroshi Yamashita, Isao Amemiya, Kunio Takeuchi, Hideki Masaoka, Kimitoshi Takahashi, Akihiro Ikeda, Yukinori Kuroki, Masaki Yamabe

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The effectiveness of hierarchical data processing capabilities using Anaheim, a 70 nm system-on-a-chip (SoC) devices in electron projection lithography (EPL) was analyzed. Selete's 10 PC-clustered hierarchical data processing system was used to reduce the data processing time and output data volume of a complementary split by M-Split from 57 to 7.7 min and from 12.4 to 1.7 Gb. The complementary exposure of the Anaheim using Nikon's electron beam (EB) stepper, NSR-EB1A and a high-performance Si stencil mask fabricated by HOYA was performed. The results show that the complementary exposure technique, including a complementary mask pattern split and stencil mask fabrication, is no longer a critical issue for EPL.

Original languageEnglish
Pages (from-to)2645-2649
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number6
Publication statusPublished - Nov 1 2003

Fingerprint

systems-on-a-chip
Lithography
Masks
masks
lithography
projection
Electrons
electrons
Electron beams
electron beams
Fabrication
fabrication
output

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Yamashita, H., Amemiya, I., Takeuchi, K., Masaoka, H., Takahashi, K., Ikeda, A., ... Yamabe, M. (2003). Complementary exposure of 70 nm SoC devices in electron projection lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 21(6), 2645-2649.

Complementary exposure of 70 nm SoC devices in electron projection lithography. / Yamashita, Hiroshi; Amemiya, Isao; Takeuchi, Kunio; Masaoka, Hideki; Takahashi, Kimitoshi; Ikeda, Akihiro; Kuroki, Yukinori; Yamabe, Masaki.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 6, 01.11.2003, p. 2645-2649.

Research output: Contribution to journalArticle

Yamashita, H, Amemiya, I, Takeuchi, K, Masaoka, H, Takahashi, K, Ikeda, A, Kuroki, Y & Yamabe, M 2003, 'Complementary exposure of 70 nm SoC devices in electron projection lithography', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 6, pp. 2645-2649.
Yamashita, Hiroshi ; Amemiya, Isao ; Takeuchi, Kunio ; Masaoka, Hideki ; Takahashi, Kimitoshi ; Ikeda, Akihiro ; Kuroki, Yukinori ; Yamabe, Masaki. / Complementary exposure of 70 nm SoC devices in electron projection lithography. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2003 ; Vol. 21, No. 6. pp. 2645-2649.
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