Concealing surface topography by attachment of nanometer-thick film

Hirohmi Watanabe, Aya Fujimoto, Atsushi Takahara

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Concealing of surface topology of substrates by decal-like attachment of nanomembrane is demonstrated. The nanomembrane attachment provides a flat surface on various substrates, including porous substrates, and the surface property such as wettability was changed to that of the nanomembrane. The monitoring of drying process revealed that a nanomembrane with certain thickness tolerates their flexural deflection during the procedure. Moreover, the supporting position of nanomembranes as well as the physical properties of nanomembranes strongly affected the degree of deflection. The decal-like attachment of nanomembranes shown here is potentially a powerful method for creating a new functional surface that is independent of the topological and chemical properties of the original substrate.

Original languageEnglish
Pages (from-to)2906-2911
Number of pages6
JournalLangmuir
Volume29
Issue number9
DOIs
Publication statusPublished - Mar 5 2013

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All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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