Conformal photo-resist coating technique in the through-silicon via of the semiconductor devices with the rotary atomising aerosol spray

Yoshiyuki Seike, Masanori Ohtsubo, Futoshi Shimai, Kenji Maruyama, Hiroyuki Akenaga, Yoshinori Kobayashi, Keiji Miyachi, Masahiko Amari, Toshiro Doi, Syuhei Kurokawa

Research output: Contribution to journal › Article › peer-review

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