Control of large area VHF plasma produced at high pressure

Tatsuyuki Nishimiya; Tsukasa Yamane; Yoshiaki Takeuchi; Yasuhiro Yamauchi; Hiromu Takatsuka; Hiroshi Muta; Kiichiro Uchino; Yoshinobu Kawai

doi:10.1016/j.tsf.2011.01.379

Control of large area VHF plasma produced at high pressure

Tatsuyuki Nishimiya, Tsukasa Yamane, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

Electrical Engineering Sciences

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

The control of very high frequency (VHF) discharge plasma at high pressures was attempted by loading a variable capacitor to the end of the multi rod electrode with which VHF plasma (frequency 60 MHz) was produced. It was found that the discharge region is controlled with the variable capacitor and VHF plasma uniform over 1 m is produced at high pressures.

Original language	English
Pages (from-to)	6931-6934
Number of pages	4
Journal	Thin Solid Films
Volume	519
Issue number	20
DOIs	https://doi.org/10.1016/j.tsf.2011.01.379
Publication status	Published - Aug 1 2011

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2011.01.379

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AU - Nishimiya, Tatsuyuki

AU - Yamane, Tsukasa

AU - Takeuchi, Yoshiaki

AU - Yamauchi, Yasuhiro

AU - Takatsuka, Hiromu

AU - Muta, Hiroshi

AU - Uchino, Kiichiro

AU - Kawai, Yoshinobu

PY - 2011/8/1

Y1 - 2011/8/1

N2 - The control of very high frequency (VHF) discharge plasma at high pressures was attempted by loading a variable capacitor to the end of the multi rod electrode with which VHF plasma (frequency 60 MHz) was produced. It was found that the discharge region is controlled with the variable capacitor and VHF plasma uniform over 1 m is produced at high pressures.

AB - The control of very high frequency (VHF) discharge plasma at high pressures was attempted by loading a variable capacitor to the end of the multi rod electrode with which VHF plasma (frequency 60 MHz) was produced. It was found that the discharge region is controlled with the variable capacitor and VHF plasma uniform over 1 m is produced at high pressures.

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JO - Thin Solid Films

JF - Thin Solid Films

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ER -

Control of large area VHF plasma produced at high pressure

Abstract

All Science Journal Classification (ASJC) codes

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