Control of large area VHF plasma produced at high pressure

Tatsuyuki Nishimiya, Tsukasa Yamane, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

The control of very high frequency (VHF) discharge plasma at high pressures was attempted by loading a variable capacitor to the end of the multi rod electrode with which VHF plasma (frequency 60 MHz) was produced. It was found that the discharge region is controlled with the variable capacitor and VHF plasma uniform over 1 m is produced at high pressures.

Original languageEnglish
Pages (from-to)6931-6934
Number of pages4
JournalThin Solid Films
Volume519
Issue number20
DOIs
Publication statusPublished - Aug 1 2011

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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  • Cite this

    Nishimiya, T., Yamane, T., Takeuchi, Y., Yamauchi, Y., Takatsuka, H., Muta, H., Uchino, K., & Kawai, Y. (2011). Control of large area VHF plasma produced at high pressure. Thin Solid Films, 519(20), 6931-6934. https://doi.org/10.1016/j.tsf.2011.01.379