Control of the electron temperature by varying the resonance zone width in ECR plasma

Naho Itagaki, H. Muta, N. Ishii, Y. Kawai

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

The electron temperature (Te) in an electron cyclotron resonance plasma is clarified to depend on the spatial profiles of the microwave-power absorption by both the electromagnetic-waves measurement and the simulation of microwave power absorption. It is found that Te is controlled by varying the magnetic field configuration and/or the microwave frequency since the power absorption profile is influenced by the effective resonance width. In fact, Te is observed to decrease with decreasing the magnetic field gradient at the resonance point for N2, Ar and O2/Ar plasma.

Original languageEnglish
Pages (from-to)59-63
Number of pages5
JournalThin Solid Films
Volume457
Issue number1
DOIs
Publication statusPublished - Jun 1 2004
Event16th Symposium on Plasma Science for Materials (SPSM-16) - Tokyo, Japan
Duration: Jun 4 2003Jun 5 2003

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Electron temperature
Microwaves
electron energy
Magnetic fields
Plasmas
Electron cyclotron resonance
Microwave frequencies
Electromagnetic waves
microwaves
magnetic field configurations
profiles
electron cyclotron resonance
microwave frequencies
Temperature
electromagnetic radiation
gradients
temperature
magnetic fields
simulation

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Control of the electron temperature by varying the resonance zone width in ECR plasma. / Itagaki, Naho; Muta, H.; Ishii, N.; Kawai, Y.

In: Thin Solid Films, Vol. 457, No. 1, 01.06.2004, p. 59-63.

Research output: Contribution to journalConference article

Itagaki, Naho ; Muta, H. ; Ishii, N. ; Kawai, Y. / Control of the electron temperature by varying the resonance zone width in ECR plasma. In: Thin Solid Films. 2004 ; Vol. 457, No. 1. pp. 59-63.
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