Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si

Byoung Min Lee, Baek Seok Seong, Hak Rho Kim, Shinji Munetoh, Teruaki Motooka

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    To investigate the cooling mechanism and the local structural changes of excimer laser-annealed silicon (Si), molecular dynamics (MD) simulations were performed. Heat flow of molten Si showed a strong dependency of the local region during a natural cooling. An amorphous-to-liquid transition near an interface in the temperature range of 1600 K ∼ 1800 K was expected with the results of the local diffusion coefficients calculated by integrating the velocity autocorrelation functions. It was confirmed that the structure of the interface region affected the cooling rate of the overall system. The structural properties at the various local regions after a cooling were assessed in terms of the configurational properties including the coordination and bond-angle distributions. A spontaneous nucleation of Si near a interface was observed during a natural cooling.

    Original languageEnglish
    Title of host publicationMultiscale Modeling of Materials
    PublisherMaterials Research Society
    Pages225-230
    Number of pages6
    ISBN (Print)9781604234268
    DOIs
    Publication statusPublished - 2006
    Event2006 MRS Fall Meeting - Boston, MA, United States
    Duration: Nov 27 2006Dec 1 2006

    Publication series

    NameMaterials Research Society Symposium Proceedings
    Volume978
    ISSN (Print)0272-9172

    Other

    Other2006 MRS Fall Meeting
    CountryUnited States
    CityBoston, MA
    Period11/27/0612/1/06

    All Science Journal Classification (ASJC) codes

    • Materials Science(all)
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

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