Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si

Byoung Min Lee; Baek Seok Seong; Hak Rho Kim; Shinji Munetoh; Teruaki Motooka

doi:10.1557/proc-978-0978-gg13-01

Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si

Byoung Min Lee, Baek Seok Seong, Hak Rho Kim, Shinji Munetoh, Teruaki Motooka

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

To investigate the cooling mechanism and the local structural changes of excimer laser-annealed silicon (Si), molecular dynamics (MD) simulations were performed. Heat flow of molten Si showed a strong dependency of the local region during a natural cooling. An amorphous-to-liquid transition near an interface in the temperature range of 1600 K ∼ 1800 K was expected with the results of the local diffusion coefficients calculated by integrating the velocity autocorrelation functions. It was confirmed that the structure of the interface region affected the cooling rate of the overall system. The structural properties at the various local regions after a cooling were assessed in terms of the configurational properties including the coordination and bond-angle distributions. A spontaneous nucleation of Si near a interface was observed during a natural cooling.

Original language	English
Title of host publication	Multiscale Modeling of Materials
Publisher	Materials Research Society
Pages	225-230
Number of pages	6
ISBN (Print)	9781604234268
DOIs	https://doi.org/10.1557/proc-978-0978-gg13-01
Publication status	Published - 2006
Event	2006 MRS Fall Meeting - Boston, MA, United States Duration: Nov 27 2006 → Dec 1 2006

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	978
ISSN (Print)	0272-9172

Other

Other	2006 MRS Fall Meeting
Country/Territory	United States
City	Boston, MA
Period	11/27/06 → 12/1/06

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1557/proc-978-0978-gg13-01

Cite this

Lee, B. M., Seong, B. S., Kim, H. R., Munetoh, S., & Motooka, T. (2006). Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si. In Multiscale Modeling of Materials (pp. 225-230). (Materials Research Society Symposium Proceedings; Vol. 978). Materials Research Society. https://doi.org/10.1557/proc-978-0978-gg13-01

Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si. / Lee, Byoung Min; Seong, Baek Seok; Kim, Hak Rho et al.
Multiscale Modeling of Materials. Materials Research Society, 2006. p. 225-230 (Materials Research Society Symposium Proceedings; Vol. 978).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Lee, BM, Seong, BS, Kim, HR, Munetoh, S & Motooka, T 2006, Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si. in Multiscale Modeling of Materials. Materials Research Society Symposium Proceedings, vol. 978, Materials Research Society, pp. 225-230, 2006 MRS Fall Meeting, Boston, MA, United States, 11/27/06. https://doi.org/10.1557/proc-978-0978-gg13-01

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abstract = "To investigate the cooling mechanism and the local structural changes of excimer laser-annealed silicon (Si), molecular dynamics (MD) simulations were performed. Heat flow of molten Si showed a strong dependency of the local region during a natural cooling. An amorphous-to-liquid transition near an interface in the temperature range of 1600 K ∼ 1800 K was expected with the results of the local diffusion coefficients calculated by integrating the velocity autocorrelation functions. It was confirmed that the structure of the interface region affected the cooling rate of the overall system. The structural properties at the various local regions after a cooling were assessed in terms of the configurational properties including the coordination and bond-angle distributions. A spontaneous nucleation of Si near a interface was observed during a natural cooling.",

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AB - To investigate the cooling mechanism and the local structural changes of excimer laser-annealed silicon (Si), molecular dynamics (MD) simulations were performed. Heat flow of molten Si showed a strong dependency of the local region during a natural cooling. An amorphous-to-liquid transition near an interface in the temperature range of 1600 K ∼ 1800 K was expected with the results of the local diffusion coefficients calculated by integrating the velocity autocorrelation functions. It was confirmed that the structure of the interface region affected the cooling rate of the overall system. The structural properties at the various local regions after a cooling were assessed in terms of the configurational properties including the coordination and bond-angle distributions. A spontaneous nucleation of Si near a interface was observed during a natural cooling.

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Cooling mechanism and structural change of local regions with a different cooling rate of excimer laser annealed Si

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