Correlation between defect structures and hardness in tantalum irradiated by heavy ions

K. Yasunaga, Hideo Watanabe, N. Yoshida, T. Muroga, N. Noda

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Pure tantalum specimens were irradiated with 2.4 MeV Cu2+ ions up to 3 dpa at temperatures between room temperature and 1073 K. Transmission electron microscope (TEM) observation and micro-indentation tests were carried out to correlate the microstructure and the hardness. Significant radiation hardening occurred at temperature ranging from 673 to 873 K. Isochronal annealing of a specimen irradiated at room temperature up to a dose of 0.3 dpa resulted in a rapid increase in hardening between 573 and 673 K and continued to increase up to 873 K. The microstructure showed that the formation of small defect clusters is the major reason for both the radiation hardening and the radiation-anneal hardening.

Original languageEnglish
Pages (from-to)179-182
Number of pages4
JournalJournal of Nuclear Materials
Volume283-287
Issue numberPART I
DOIs
Publication statusPublished - Jan 1 2000

Fingerprint

radiation hardening
Tantalum
Heavy Ions
Defect structures
Radiation hardening
tantalum
Heavy ions
heavy ions
hardness
Hardness
defects
microstructure
room temperature
indentation
hardening
Temperature
Microstructure
electron microscopes
Indentation
Hardening

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering

Cite this

Correlation between defect structures and hardness in tantalum irradiated by heavy ions. / Yasunaga, K.; Watanabe, Hideo; Yoshida, N.; Muroga, T.; Noda, N.

In: Journal of Nuclear Materials, Vol. 283-287, No. PART I, 01.01.2000, p. 179-182.

Research output: Contribution to journalArticle

Yasunaga, K. ; Watanabe, Hideo ; Yoshida, N. ; Muroga, T. ; Noda, N. / Correlation between defect structures and hardness in tantalum irradiated by heavy ions. In: Journal of Nuclear Materials. 2000 ; Vol. 283-287, No. PART I. pp. 179-182.
@article{ea2e08ea1c5d45d89faaa245a10dc373,
title = "Correlation between defect structures and hardness in tantalum irradiated by heavy ions",
abstract = "Pure tantalum specimens were irradiated with 2.4 MeV Cu2+ ions up to 3 dpa at temperatures between room temperature and 1073 K. Transmission electron microscope (TEM) observation and micro-indentation tests were carried out to correlate the microstructure and the hardness. Significant radiation hardening occurred at temperature ranging from 673 to 873 K. Isochronal annealing of a specimen irradiated at room temperature up to a dose of 0.3 dpa resulted in a rapid increase in hardening between 573 and 673 K and continued to increase up to 873 K. The microstructure showed that the formation of small defect clusters is the major reason for both the radiation hardening and the radiation-anneal hardening.",
author = "K. Yasunaga and Hideo Watanabe and N. Yoshida and T. Muroga and N. Noda",
year = "2000",
month = "1",
day = "1",
doi = "10.1016/S0022-3115(00)00354-8",
language = "English",
volume = "283-287",
pages = "179--182",
journal = "Journal of Nuclear Materials",
issn = "0022-3115",
publisher = "Elsevier",
number = "PART I",

}

TY - JOUR

T1 - Correlation between defect structures and hardness in tantalum irradiated by heavy ions

AU - Yasunaga, K.

AU - Watanabe, Hideo

AU - Yoshida, N.

AU - Muroga, T.

AU - Noda, N.

PY - 2000/1/1

Y1 - 2000/1/1

N2 - Pure tantalum specimens were irradiated with 2.4 MeV Cu2+ ions up to 3 dpa at temperatures between room temperature and 1073 K. Transmission electron microscope (TEM) observation and micro-indentation tests were carried out to correlate the microstructure and the hardness. Significant radiation hardening occurred at temperature ranging from 673 to 873 K. Isochronal annealing of a specimen irradiated at room temperature up to a dose of 0.3 dpa resulted in a rapid increase in hardening between 573 and 673 K and continued to increase up to 873 K. The microstructure showed that the formation of small defect clusters is the major reason for both the radiation hardening and the radiation-anneal hardening.

AB - Pure tantalum specimens were irradiated with 2.4 MeV Cu2+ ions up to 3 dpa at temperatures between room temperature and 1073 K. Transmission electron microscope (TEM) observation and micro-indentation tests were carried out to correlate the microstructure and the hardness. Significant radiation hardening occurred at temperature ranging from 673 to 873 K. Isochronal annealing of a specimen irradiated at room temperature up to a dose of 0.3 dpa resulted in a rapid increase in hardening between 573 and 673 K and continued to increase up to 873 K. The microstructure showed that the formation of small defect clusters is the major reason for both the radiation hardening and the radiation-anneal hardening.

UR - http://www.scopus.com/inward/record.url?scp=0034539769&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034539769&partnerID=8YFLogxK

U2 - 10.1016/S0022-3115(00)00354-8

DO - 10.1016/S0022-3115(00)00354-8

M3 - Article

VL - 283-287

SP - 179

EP - 182

JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

SN - 0022-3115

IS - PART I

ER -