Correlation between volume fraction of silicon clusters in amorphous silicon films and optical emission properties of Si* and SiH*

Yeonwon Kim, Kosuke Hatozaki, Yuji Hashimoto, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The volume fraction of silicon clusters in amorphous silicon (a-Si:H) films has been investigated using specially designed quartz crystal microbalances (QCMs) together with optical emission spectroscopy (OES). The optical emission intensities of Si* and SiH* and their intensity ratios are selected for comparison with the QCM results. We show that the volume fraction of silicon clusters strongly correlates with not only the electron temperature but also the SiH* intensity. This suggests that the ratios of Si*/SiH* and SiH* can be used to predict the volume fraction of Si clusters in a-Si:H films.

Original languageEnglish
Article number11NA07
JournalJapanese journal of applied physics
Volume52
Issue number11 PART 2
DOIs
Publication statusPublished - Nov 1 2013

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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