CP mask optimization for enhancing the throughput of MCC systems

Makoto Sugihara, Kenta Nakamura, Yusuke Matsunaga, Kazuaki Murakami

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)

Abstract

The character projection (CP) is utilized for maskless lithography and is a potential for the future photomask manufacture because the CP lithography can project ICs much faster than point beam projection or variable-shaped beam (VSB) projection. In this paper, we present CP mask optimization for multi-column-cell (MCC) systems, in which column-cells can project patterns in parallel with the CP and the VSB, so that their throughput is maximized. This paper presents an MINLP (mixed integer nonlinear programming) model as well as an MIP (mixed integer programming) model for optimizing a CP mask set of an MCC projection system so that projection time is minimized. The experimental results show that our optimization has achieved 71.3% less projection time for a two-column-cell system than that for a single-column-cell (SCC) system. For the two-column-cell system, it has also achieved 42.6% less projection time than a naive CP mask development approach. The experimental results denote that our optimization achieves projection time reduction more than parallelizing two column-cells by virtually increasing logic cells which are placed on CP masks and decreasing VSB projection.

Original languageEnglish
Title of host publicationPhotomask Technology 2006
DOIs
Publication statusPublished - Dec 1 2006
Event26th Annual BACUS Symposium on Photomask Technology 2006 - Monterey, CA, United States
Duration: Sep 19 2006Sep 22 2006

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6349 I
ISSN (Print)0277-786X

Other

Other26th Annual BACUS Symposium on Photomask Technology 2006
CountryUnited States
CityMonterey, CA
Period9/19/069/22/06

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Sugihara, M., Nakamura, K., Matsunaga, Y., & Murakami, K. (2006). CP mask optimization for enhancing the throughput of MCC systems. In Photomask Technology 2006 [63494B] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6349 I). https://doi.org/10.1117/12.685501