Crystal structure comparison between conductive SrRuO3 and CaRuO3 thin films

N. Higashi, Takayuki Watanabe, K. Saito, I. Yamaji, T. Akai, H. Funakubo

Research output: Contribution to journalArticle

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Abstract

About 70nm-thick SrRuO3 and CaRuO3 thin films were deposited by metalorganic chemical vapor deposition (MOCVD) on (0 0 1)SrTiO3 and (0 0 1)[(LaAlO3)0.3-(SrAl0.5Ta0.5O 3)]0.7 (LSAT) substrates at 750°C. SrRuO3 and CaRuO3 thin films were epitaxially grown on both substrates. All films had very smooth surfaces. The detailed crystal structure was investigated by using high-resolution X-ray reciprocal space mapping. The in-plane lattice parameter of SrRuO3 thin film on (0 0 1)SrTiO3 substrate was almost the same as that of SrTiO3, 3.905 Å, and the out-plane lattice parameter was 3.96 Å which was larger than bulk SrRuO3. On the other hand, in the case of SrRuO3 thin film on (0 0 1)LSAT substrates, both the in-plane and out-plane lattice parameters of SrRuO3 film were almost the same as those reported for the bulk. Those of the CaRuO3 thin film on (0 0 1)SrTiO3 was almost the same as the reported values for the bulk, while on (0 0 1)LSAT, the in-plane lattice parameter was almost the same as that of LSAT. These results can be explain the strain remained in the thin films due to the smaller lattice mismatch combination between the thin film and the substrate, i.e. SrRuO3 film on SrTiO3 substrate and CaRuO3 film on LSAT substrate.

Original languageEnglish
Pages (from-to)450-456
Number of pages7
JournalJournal of Crystal Growth
Volume229
Issue number1
DOIs
Publication statusPublished - Jul 2 2001
Externally publishedYes

Fingerprint

Crystal structure
Thin films
crystal structure
Substrates
Lattice constants
thin films
lattice parameters
Lattice mismatch
Metallorganic chemical vapor deposition
metalorganic chemical vapor deposition
strontium titanium oxide
X rays
high resolution
x rays

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

Cite this

Crystal structure comparison between conductive SrRuO3 and CaRuO3 thin films. / Higashi, N.; Watanabe, Takayuki; Saito, K.; Yamaji, I.; Akai, T.; Funakubo, H.

In: Journal of Crystal Growth, Vol. 229, No. 1, 02.07.2001, p. 450-456.

Research output: Contribution to journalArticle

Higashi, N. ; Watanabe, Takayuki ; Saito, K. ; Yamaji, I. ; Akai, T. ; Funakubo, H. / Crystal structure comparison between conductive SrRuO3 and CaRuO3 thin films. In: Journal of Crystal Growth. 2001 ; Vol. 229, No. 1. pp. 450-456.
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abstract = "About 70nm-thick SrRuO3 and CaRuO3 thin films were deposited by metalorganic chemical vapor deposition (MOCVD) on (0 0 1)SrTiO3 and (0 0 1)[(LaAlO3)0.3-(SrAl0.5Ta0.5O 3)]0.7 (LSAT) substrates at 750°C. SrRuO3 and CaRuO3 thin films were epitaxially grown on both substrates. All films had very smooth surfaces. The detailed crystal structure was investigated by using high-resolution X-ray reciprocal space mapping. The in-plane lattice parameter of SrRuO3 thin film on (0 0 1)SrTiO3 substrate was almost the same as that of SrTiO3, 3.905 {\AA}, and the out-plane lattice parameter was 3.96 {\AA} which was larger than bulk SrRuO3. On the other hand, in the case of SrRuO3 thin film on (0 0 1)LSAT substrates, both the in-plane and out-plane lattice parameters of SrRuO3 film were almost the same as those reported for the bulk. Those of the CaRuO3 thin film on (0 0 1)SrTiO3 was almost the same as the reported values for the bulk, while on (0 0 1)LSAT, the in-plane lattice parameter was almost the same as that of LSAT. These results can be explain the strain remained in the thin films due to the smaller lattice mismatch combination between the thin film and the substrate, i.e. SrRuO3 film on SrTiO3 substrate and CaRuO3 film on LSAT substrate.",
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N2 - About 70nm-thick SrRuO3 and CaRuO3 thin films were deposited by metalorganic chemical vapor deposition (MOCVD) on (0 0 1)SrTiO3 and (0 0 1)[(LaAlO3)0.3-(SrAl0.5Ta0.5O 3)]0.7 (LSAT) substrates at 750°C. SrRuO3 and CaRuO3 thin films were epitaxially grown on both substrates. All films had very smooth surfaces. The detailed crystal structure was investigated by using high-resolution X-ray reciprocal space mapping. The in-plane lattice parameter of SrRuO3 thin film on (0 0 1)SrTiO3 substrate was almost the same as that of SrTiO3, 3.905 Å, and the out-plane lattice parameter was 3.96 Å which was larger than bulk SrRuO3. On the other hand, in the case of SrRuO3 thin film on (0 0 1)LSAT substrates, both the in-plane and out-plane lattice parameters of SrRuO3 film were almost the same as those reported for the bulk. Those of the CaRuO3 thin film on (0 0 1)SrTiO3 was almost the same as the reported values for the bulk, while on (0 0 1)LSAT, the in-plane lattice parameter was almost the same as that of LSAT. These results can be explain the strain remained in the thin films due to the smaller lattice mismatch combination between the thin film and the substrate, i.e. SrRuO3 film on SrTiO3 substrate and CaRuO3 film on LSAT substrate.

AB - About 70nm-thick SrRuO3 and CaRuO3 thin films were deposited by metalorganic chemical vapor deposition (MOCVD) on (0 0 1)SrTiO3 and (0 0 1)[(LaAlO3)0.3-(SrAl0.5Ta0.5O 3)]0.7 (LSAT) substrates at 750°C. SrRuO3 and CaRuO3 thin films were epitaxially grown on both substrates. All films had very smooth surfaces. The detailed crystal structure was investigated by using high-resolution X-ray reciprocal space mapping. The in-plane lattice parameter of SrRuO3 thin film on (0 0 1)SrTiO3 substrate was almost the same as that of SrTiO3, 3.905 Å, and the out-plane lattice parameter was 3.96 Å which was larger than bulk SrRuO3. On the other hand, in the case of SrRuO3 thin film on (0 0 1)LSAT substrates, both the in-plane and out-plane lattice parameters of SrRuO3 film were almost the same as those reported for the bulk. Those of the CaRuO3 thin film on (0 0 1)SrTiO3 was almost the same as the reported values for the bulk, while on (0 0 1)LSAT, the in-plane lattice parameter was almost the same as that of LSAT. These results can be explain the strain remained in the thin films due to the smaller lattice mismatch combination between the thin film and the substrate, i.e. SrRuO3 film on SrTiO3 substrate and CaRuO3 film on LSAT substrate.

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