Abstract
We report a highly selective adsorbent for Cu(II) prepared using the metal-imprinted technique. As the base material, we used the natural adsorbent chitosan, which can be obtained from chitin by the deacetylation reaction. Chitosan was modified with ketoglutaric acid to introduce multiple functional carboxyl groups, which interact with metal cations. Cu(II)-imprinted chitosan was prepared by the imprinting technique and its behavior as an adsorbent for various metal ions, including Cu(II), Ni(II), Co(II), Zn(II), and Cd(II), was investigated. Cu(II)-imprinted chitosan exhibited extremely high selectivity for the imprinted Cu(II) ion compared with the other metal ions. This result indicates that the metal imprinting technique is very useful for the development of highly selective adsorbents. However, desorption of Cu(II) from the imprinted adsorbent was not sufficient because of the strong binding between Cu(II) and the imprinted adsorption sites.
| Original language | English |
|---|---|
| Pages (from-to) | 630-634 |
| Number of pages | 5 |
| Journal | JOURNAL OF CHEMICAL ENGINEERING OF JAPAN |
| Volume | 49 |
| Issue number | 7 |
| DOIs | |
| Publication status | Published - Jan 1 2016 |
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All Science Journal Classification (ASJC) codes
- Chemistry(all)
- Chemical Engineering(all)
Cite this
Cu(II)-imprinted chitosan derivative containing carboxyl groups for the selective removal of Cu(II) from aqueous solution. / Yoshida, Wataru; Oshima, Tatsuya; Baba, Yoshinari; Goto, Masahiro.
In: JOURNAL OF CHEMICAL ENGINEERING OF JAPAN, Vol. 49, No. 7, 01.01.2016, p. 630-634.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Cu(II)-imprinted chitosan derivative containing carboxyl groups for the selective removal of Cu(II) from aqueous solution
AU - Yoshida, Wataru
AU - Oshima, Tatsuya
AU - Baba, Yoshinari
AU - Goto, Masahiro
PY - 2016/1/1
Y1 - 2016/1/1
N2 - We report a highly selective adsorbent for Cu(II) prepared using the metal-imprinted technique. As the base material, we used the natural adsorbent chitosan, which can be obtained from chitin by the deacetylation reaction. Chitosan was modified with ketoglutaric acid to introduce multiple functional carboxyl groups, which interact with metal cations. Cu(II)-imprinted chitosan was prepared by the imprinting technique and its behavior as an adsorbent for various metal ions, including Cu(II), Ni(II), Co(II), Zn(II), and Cd(II), was investigated. Cu(II)-imprinted chitosan exhibited extremely high selectivity for the imprinted Cu(II) ion compared with the other metal ions. This result indicates that the metal imprinting technique is very useful for the development of highly selective adsorbents. However, desorption of Cu(II) from the imprinted adsorbent was not sufficient because of the strong binding between Cu(II) and the imprinted adsorption sites.
AB - We report a highly selective adsorbent for Cu(II) prepared using the metal-imprinted technique. As the base material, we used the natural adsorbent chitosan, which can be obtained from chitin by the deacetylation reaction. Chitosan was modified with ketoglutaric acid to introduce multiple functional carboxyl groups, which interact with metal cations. Cu(II)-imprinted chitosan was prepared by the imprinting technique and its behavior as an adsorbent for various metal ions, including Cu(II), Ni(II), Co(II), Zn(II), and Cd(II), was investigated. Cu(II)-imprinted chitosan exhibited extremely high selectivity for the imprinted Cu(II) ion compared with the other metal ions. This result indicates that the metal imprinting technique is very useful for the development of highly selective adsorbents. However, desorption of Cu(II) from the imprinted adsorbent was not sufficient because of the strong binding between Cu(II) and the imprinted adsorption sites.
UR - http://www.scopus.com/inward/record.url?scp=84978689353&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84978689353&partnerID=8YFLogxK
U2 - 10.1252/jcej.15we293
DO - 10.1252/jcej.15we293
M3 - Article
AN - SCOPUS:84978689353
VL - 49
SP - 630
EP - 634
JO - Journal of Chemical Engineering of Japan
JF - Journal of Chemical Engineering of Japan
SN - 0021-9592
IS - 7
ER -