CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment

Toshiki Tsubota, Shintaro Ida, Naoki Okada, Masanori Nagata, Yasumichi Matsumoto, Nobumitsu Yatsushiro

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Electrophoresis was utilized as a seeding process for CVD diamond synthesis. The number of diamond particles deposited depended on the electrophoretic conditions. After the electrophoretic deposition process, CVD diamond film was synthesized on WC-Co substrate using ECR microwave plasma CVD apparatus. The density of nuclei after the CVD process was insufficient for the formation of diamond film in the case of no Co removal by acid, when a scratching pretreatment was adopted. On the other hand, electrophoretic deposition was effective for the formation of film-type deposits.

Original languageEnglish
Pages (from-to)262-265
Number of pages4
JournalSurface and Coatings Technology
Volume169-170
DOIs
Publication statusPublished - Jun 2 2003

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Fingerprint Dive into the research topics of 'CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment'. Together they form a unique fingerprint.

  • Cite this