CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment

Toshiki Tsubota, Shintaro Ida, Naoki Okada, Masanori Nagata, Yasumichi Matsumoto, Nobumitsu Yatsushiro

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Electrophoresis was utilized as a seeding process for CVD diamond synthesis. The number of diamond particles deposited depended on the electrophoretic conditions. After the electrophoretic deposition process, CVD diamond film was synthesized on WC-Co substrate using ECR microwave plasma CVD apparatus. The density of nuclei after the CVD process was insufficient for the formation of diamond film in the case of no Co removal by acid, when a scratching pretreatment was adopted. On the other hand, electrophoretic deposition was effective for the formation of film-type deposits.

Original languageEnglish
Pages (from-to)262-265
Number of pages4
JournalSurface and Coatings Technology
Volume169-170
DOIs
Publication statusPublished - Jun 2 2003

Fingerprint

Diamond
Cutting tools
inoculation
pretreatment
Chemical vapor deposition
Diamonds
diamonds
Diamond films
vapor deposition
coatings
Coatings
diamond films
Plasma CVD
Electrophoresis
Deposits
electrophoresis
Microwaves
Acids
deposits
Substrates

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment. / Tsubota, Toshiki; Ida, Shintaro; Okada, Naoki; Nagata, Masanori; Matsumoto, Yasumichi; Yatsushiro, Nobumitsu.

In: Surface and Coatings Technology, Vol. 169-170, 02.06.2003, p. 262-265.

Research output: Contribution to journalArticle

Tsubota, Toshiki ; Ida, Shintaro ; Okada, Naoki ; Nagata, Masanori ; Matsumoto, Yasumichi ; Yatsushiro, Nobumitsu. / CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment. In: Surface and Coatings Technology. 2003 ; Vol. 169-170. pp. 262-265.
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AU - Yatsushiro, Nobumitsu

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