CVD diamond coating on WC cutting tool using electrophoresis

Toshiki Tsubota, Masanori Nagata, Naoki Okada, Shintaro Ida, Yasumichi Matsumoto, Nobumitsu Yatsushiro

Research output: Contribution to journalArticle

Abstract

CVD diamond films were deposited on commercial WC cutting tools. An electron cyclotron resonance micro-wave plasma chemical vapor deposition (ECR-MPCVD) apparatus was used to deposit diamond films. Methane and hydrogen were used as gaseous source for CVD, and WC-Co (JIS standard: K-10) was used as a substrate for CVD. Cobalt on the surface of the WC cutting tool prevented CVD diamond from depositing on the WC cutting tool. Scratching with diamond particles on the surface of the WC cutting tool, which is one of the most popular pretreatments for enhancing the nuclei density of CVD diamond, was ineffective on the WC cutting tool without removing surface cobalt. On the other hand, Electrophoresis treatment was effective for increasing diamond nuclei density on the WC cutting tool without removing surface cobalt. However, CVD diamond films synthesized on the WC cutting tool (from which surface cobalt was removed) using electrophoresis pretreatment separated from the surface of the WC cutting tool. To improve the adhesion between CVD diamond film and WC cutting tool, heat treatment was performed after electrophoresis pretreatment. The heat treatment condition was 500°C for 1 h in Ar flow. The heat treatment after electrophoresis treatment was effective for improving adhesion between WC surface and CVD diamond film. Vickers hardness test was carried out for estimating the adhesion. The Vickers hardness of the CVD diamond film obtained by the electrophoresis-heat pretreatment, was as hard as that of a CVD diamond film obtained with conventional scratching pretreatment. From the results of Vickers hardness test, it was found that heat treatment after electrophoresis process is effective for improving the strength of the adhesion layer.

Original languageEnglish
Pages (from-to)782-788
Number of pages7
JournalJournal of the Ceramic Society of Japan
Volume109
Issue number1273
DOIs
Publication statusPublished - Sep 2001

Fingerprint

Diamond
Cutting tools
electrophoresis
Electrophoresis
Chemical vapor deposition
Diamonds
diamonds
vapor deposition
Diamond films
coatings
diamond films
Coatings
pretreatment
Cobalt
Vickers hardness
adhesion
heat treatment
cobalt
Adhesion
Heat treatment

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

Cite this

Tsubota, T., Nagata, M., Okada, N., Ida, S., Matsumoto, Y., & Yatsushiro, N. (2001). CVD diamond coating on WC cutting tool using electrophoresis. Journal of the Ceramic Society of Japan, 109(1273), 782-788. https://doi.org/10.2109/jcersj.109.1273_782

CVD diamond coating on WC cutting tool using electrophoresis. / Tsubota, Toshiki; Nagata, Masanori; Okada, Naoki; Ida, Shintaro; Matsumoto, Yasumichi; Yatsushiro, Nobumitsu.

In: Journal of the Ceramic Society of Japan, Vol. 109, No. 1273, 09.2001, p. 782-788.

Research output: Contribution to journalArticle

Tsubota, T, Nagata, M, Okada, N, Ida, S, Matsumoto, Y & Yatsushiro, N 2001, 'CVD diamond coating on WC cutting tool using electrophoresis', Journal of the Ceramic Society of Japan, vol. 109, no. 1273, pp. 782-788. https://doi.org/10.2109/jcersj.109.1273_782
Tsubota T, Nagata M, Okada N, Ida S, Matsumoto Y, Yatsushiro N. CVD diamond coating on WC cutting tool using electrophoresis. Journal of the Ceramic Society of Japan. 2001 Sep;109(1273):782-788. https://doi.org/10.2109/jcersj.109.1273_782
Tsubota, Toshiki ; Nagata, Masanori ; Okada, Naoki ; Ida, Shintaro ; Matsumoto, Yasumichi ; Yatsushiro, Nobumitsu. / CVD diamond coating on WC cutting tool using electrophoresis. In: Journal of the Ceramic Society of Japan. 2001 ; Vol. 109, No. 1273. pp. 782-788.
@article{ce8ea9fcb65d48e3963c85c0c44750a9,
title = "CVD diamond coating on WC cutting tool using electrophoresis",
abstract = "CVD diamond films were deposited on commercial WC cutting tools. An electron cyclotron resonance micro-wave plasma chemical vapor deposition (ECR-MPCVD) apparatus was used to deposit diamond films. Methane and hydrogen were used as gaseous source for CVD, and WC-Co (JIS standard: K-10) was used as a substrate for CVD. Cobalt on the surface of the WC cutting tool prevented CVD diamond from depositing on the WC cutting tool. Scratching with diamond particles on the surface of the WC cutting tool, which is one of the most popular pretreatments for enhancing the nuclei density of CVD diamond, was ineffective on the WC cutting tool without removing surface cobalt. On the other hand, Electrophoresis treatment was effective for increasing diamond nuclei density on the WC cutting tool without removing surface cobalt. However, CVD diamond films synthesized on the WC cutting tool (from which surface cobalt was removed) using electrophoresis pretreatment separated from the surface of the WC cutting tool. To improve the adhesion between CVD diamond film and WC cutting tool, heat treatment was performed after electrophoresis pretreatment. The heat treatment condition was 500°C for 1 h in Ar flow. The heat treatment after electrophoresis treatment was effective for improving adhesion between WC surface and CVD diamond film. Vickers hardness test was carried out for estimating the adhesion. The Vickers hardness of the CVD diamond film obtained by the electrophoresis-heat pretreatment, was as hard as that of a CVD diamond film obtained with conventional scratching pretreatment. From the results of Vickers hardness test, it was found that heat treatment after electrophoresis process is effective for improving the strength of the adhesion layer.",
author = "Toshiki Tsubota and Masanori Nagata and Naoki Okada and Shintaro Ida and Yasumichi Matsumoto and Nobumitsu Yatsushiro",
year = "2001",
month = "9",
doi = "10.2109/jcersj.109.1273_782",
language = "English",
volume = "109",
pages = "782--788",
journal = "Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan",
issn = "1882-0743",
publisher = "Ceramic Society of Japan/Nippon Seramikkusu Kyokai",
number = "1273",

}

TY - JOUR

T1 - CVD diamond coating on WC cutting tool using electrophoresis

AU - Tsubota, Toshiki

AU - Nagata, Masanori

AU - Okada, Naoki

AU - Ida, Shintaro

AU - Matsumoto, Yasumichi

AU - Yatsushiro, Nobumitsu

PY - 2001/9

Y1 - 2001/9

N2 - CVD diamond films were deposited on commercial WC cutting tools. An electron cyclotron resonance micro-wave plasma chemical vapor deposition (ECR-MPCVD) apparatus was used to deposit diamond films. Methane and hydrogen were used as gaseous source for CVD, and WC-Co (JIS standard: K-10) was used as a substrate for CVD. Cobalt on the surface of the WC cutting tool prevented CVD diamond from depositing on the WC cutting tool. Scratching with diamond particles on the surface of the WC cutting tool, which is one of the most popular pretreatments for enhancing the nuclei density of CVD diamond, was ineffective on the WC cutting tool without removing surface cobalt. On the other hand, Electrophoresis treatment was effective for increasing diamond nuclei density on the WC cutting tool without removing surface cobalt. However, CVD diamond films synthesized on the WC cutting tool (from which surface cobalt was removed) using electrophoresis pretreatment separated from the surface of the WC cutting tool. To improve the adhesion between CVD diamond film and WC cutting tool, heat treatment was performed after electrophoresis pretreatment. The heat treatment condition was 500°C for 1 h in Ar flow. The heat treatment after electrophoresis treatment was effective for improving adhesion between WC surface and CVD diamond film. Vickers hardness test was carried out for estimating the adhesion. The Vickers hardness of the CVD diamond film obtained by the electrophoresis-heat pretreatment, was as hard as that of a CVD diamond film obtained with conventional scratching pretreatment. From the results of Vickers hardness test, it was found that heat treatment after electrophoresis process is effective for improving the strength of the adhesion layer.

AB - CVD diamond films were deposited on commercial WC cutting tools. An electron cyclotron resonance micro-wave plasma chemical vapor deposition (ECR-MPCVD) apparatus was used to deposit diamond films. Methane and hydrogen were used as gaseous source for CVD, and WC-Co (JIS standard: K-10) was used as a substrate for CVD. Cobalt on the surface of the WC cutting tool prevented CVD diamond from depositing on the WC cutting tool. Scratching with diamond particles on the surface of the WC cutting tool, which is one of the most popular pretreatments for enhancing the nuclei density of CVD diamond, was ineffective on the WC cutting tool without removing surface cobalt. On the other hand, Electrophoresis treatment was effective for increasing diamond nuclei density on the WC cutting tool without removing surface cobalt. However, CVD diamond films synthesized on the WC cutting tool (from which surface cobalt was removed) using electrophoresis pretreatment separated from the surface of the WC cutting tool. To improve the adhesion between CVD diamond film and WC cutting tool, heat treatment was performed after electrophoresis pretreatment. The heat treatment condition was 500°C for 1 h in Ar flow. The heat treatment after electrophoresis treatment was effective for improving adhesion between WC surface and CVD diamond film. Vickers hardness test was carried out for estimating the adhesion. The Vickers hardness of the CVD diamond film obtained by the electrophoresis-heat pretreatment, was as hard as that of a CVD diamond film obtained with conventional scratching pretreatment. From the results of Vickers hardness test, it was found that heat treatment after electrophoresis process is effective for improving the strength of the adhesion layer.

UR - http://www.scopus.com/inward/record.url?scp=0035439145&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035439145&partnerID=8YFLogxK

U2 - 10.2109/jcersj.109.1273_782

DO - 10.2109/jcersj.109.1273_782

M3 - Article

AN - SCOPUS:0035439145

VL - 109

SP - 782

EP - 788

JO - Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan

JF - Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan

SN - 1882-0743

IS - 1273

ER -