CVD diamond growth from nanodiamond seeds buried under a thin chromium layer

G. Degutis, P. Pobedinskas, S. Turner, Y. G. Lu, S. Al Riyami, B. Ruttens, T. Yoshitake, J. D'Haen, K. Haenen, J. Verbeeck, A. Hardy, M. K. Van Bael

    Research output: Contribution to journalArticlepeer-review

    8 Citations (Scopus)

    Abstract

    This work presents a morphological and structural analysis of CVD diamond growth on silicon from nanodiamond seeds covered by a 50 nm thick chromium layer. The role of carbon diffusion as well as chromium and carbon silicide formation is analyzed. The local diamond environment is investigated by scanning transmission electron microscopy in combination with electron energy-loss spectroscopy. The evolution of the diamond phase composition (sp3/sp2) is evaluated by micro-Raman spectroscopy. Raman and X-ray diffraction analysis are used to identify the interfacial phases formed during CVD growth. Based upon the observed morphological and structural evolution, a diamond growth model from nanodiamond seeds buried beneath a thin Cr layer is proposed.

    Original languageEnglish
    Pages (from-to)163-168
    Number of pages6
    JournalDiamond and Related Materials
    Volume64
    DOIs
    Publication statusPublished - Apr 1 2016

    All Science Journal Classification (ASJC) codes

    • Electronic, Optical and Magnetic Materials
    • Chemistry(all)
    • Mechanical Engineering
    • Materials Chemistry
    • Electrical and Electronic Engineering

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