Debris generation from CO2 and Nd:YAG laser-produced tin plasmas for EUV light source

D. Nakamura; K. Tamaru; T. Akiyama; A. Takahashi; T. Okada

doi:10.1117/12.767894

Debris generation from CO₂ and Nd:YAG laser-produced tin plasmas for EUV light source

D. Nakamura, K. Tamaru, T. Akiyama, A. Takahashi, T. Okada

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The results of a comparative investigation on the emission characteristics of debris from CO₂ laser-produced tin plasma and Nd: YAG laser-produced tin plasma for an extreme ultraviolet lithography (EUV) light source. The tin ions and droplets emitted from tin plasma produced by a CO ₂ laser or an Nd: YAG laser were detected with Faraday cups and quartz crystal micro-balance (QCM) detectors, respectively. The large size of droplets was also observed by silicon substrates as witness plates. A higher ion kinetic energy and lower debris emission in the case of CO₂ laser in compared with Nd: YAG laser for the same laser energy of ∼50 mJ. In addition, the dynamics of the neutral atoms and the irradiated target from an Nd:YAG laser-produced tin plasma with a mass-limited micro-droplet target were investigated by imaging techniques.

Original language	English
Title of host publication	Photon Processing in Microelectronics and Photonics VII
DOIs	https://doi.org/10.1117/12.767894
Publication status	Published - Jun 17 2008
Event	Photon Processing in Microelectronics and Photonics VII - San Jose, CA, United States Duration: Jan 21 2008 → Jan 24 2008

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6879
ISSN (Print)	0277-786X

Other

Other	Photon Processing in Microelectronics and Photonics VII
Country/Territory	United States
City	San Jose, CA
Period	1/21/08 → 1/24/08

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.767894

Cite this

Debris generation from CO₂ and Nd:YAG laser-produced tin plasmas for EUV light source. / Nakamura, D.; Tamaru, K.; Akiyama, T. et al.

Photon Processing in Microelectronics and Photonics VII. 2008. 687909 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6879).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Nakamura, D, Tamaru, K, Akiyama, T, Takahashi, A & Okada, T 2008, Debris generation from CO₂ and Nd:YAG laser-produced tin plasmas for EUV light source. in Photon Processing in Microelectronics and Photonics VII., 687909, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6879, Photon Processing in Microelectronics and Photonics VII, San Jose, CA, United States, 1/21/08. https://doi.org/10.1117/12.767894

@inproceedings{cc4ce557297e4e888572b1986e9bcfb8,

title = "Debris generation from CO2 and Nd:YAG laser-produced tin plasmas for EUV light source",

abstract = "The results of a comparative investigation on the emission characteristics of debris from CO2 laser-produced tin plasma and Nd: YAG laser-produced tin plasma for an extreme ultraviolet lithography (EUV) light source. The tin ions and droplets emitted from tin plasma produced by a CO 2 laser or an Nd: YAG laser were detected with Faraday cups and quartz crystal micro-balance (QCM) detectors, respectively. The large size of droplets was also observed by silicon substrates as witness plates. A higher ion kinetic energy and lower debris emission in the case of CO2 laser in compared with Nd: YAG laser for the same laser energy of ∼50 mJ. In addition, the dynamics of the neutral atoms and the irradiated target from an Nd:YAG laser-produced tin plasma with a mass-limited micro-droplet target were investigated by imaging techniques.",

author = "D. Nakamura and K. Tamaru and T. Akiyama and A. Takahashi and T. Okada",

year = "2008",

month = jun,

day = "17",

doi = "10.1117/12.767894",

language = "English",

isbn = "9780819470546",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Photon Processing in Microelectronics and Photonics VII",

note = "Photon Processing in Microelectronics and Photonics VII ; Conference date: 21-01-2008 Through 24-01-2008",

}

TY - GEN

T1 - Debris generation from CO2 and Nd:YAG laser-produced tin plasmas for EUV light source

AU - Nakamura, D.

AU - Tamaru, K.

AU - Akiyama, T.

AU - Takahashi, A.

AU - Okada, T.

PY - 2008/6/17

Y1 - 2008/6/17

N2 - The results of a comparative investigation on the emission characteristics of debris from CO2 laser-produced tin plasma and Nd: YAG laser-produced tin plasma for an extreme ultraviolet lithography (EUV) light source. The tin ions and droplets emitted from tin plasma produced by a CO 2 laser or an Nd: YAG laser were detected with Faraday cups and quartz crystal micro-balance (QCM) detectors, respectively. The large size of droplets was also observed by silicon substrates as witness plates. A higher ion kinetic energy and lower debris emission in the case of CO2 laser in compared with Nd: YAG laser for the same laser energy of ∼50 mJ. In addition, the dynamics of the neutral atoms and the irradiated target from an Nd:YAG laser-produced tin plasma with a mass-limited micro-droplet target were investigated by imaging techniques.

AB - The results of a comparative investigation on the emission characteristics of debris from CO2 laser-produced tin plasma and Nd: YAG laser-produced tin plasma for an extreme ultraviolet lithography (EUV) light source. The tin ions and droplets emitted from tin plasma produced by a CO 2 laser or an Nd: YAG laser were detected with Faraday cups and quartz crystal micro-balance (QCM) detectors, respectively. The large size of droplets was also observed by silicon substrates as witness plates. A higher ion kinetic energy and lower debris emission in the case of CO2 laser in compared with Nd: YAG laser for the same laser energy of ∼50 mJ. In addition, the dynamics of the neutral atoms and the irradiated target from an Nd:YAG laser-produced tin plasma with a mass-limited micro-droplet target were investigated by imaging techniques.

UR - http://www.scopus.com/inward/record.url?scp=44949258040&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=44949258040&partnerID=8YFLogxK

U2 - 10.1117/12.767894

DO - 10.1117/12.767894

M3 - Conference contribution

AN - SCOPUS:44949258040

SN - 9780819470546

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Photon Processing in Microelectronics and Photonics VII

T2 - Photon Processing in Microelectronics and Photonics VII

Y2 - 21 January 2008 through 24 January 2008

ER -