Decomposition of tetrafluoromethane by water plasma generated under atmospheric pressure

Narengerile; Hironori Saito; Takayuki Watanabe

doi:10.1016/j.tsf.2009.07.164

Decomposition of tetrafluoromethane by water plasma generated under atmospheric pressure

Narengerile, Hironori Saito, Takayuki Watanabe

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

Abstract

Tetrafluoromethane (CF₄) decomposition by water plasma generated under atmospheric pressure was investigated by means of thermodynamic analyses and experiments. Thermodynamic equilibrium calculations were performed between 300 and 6000 K at atmospheric pressure. Experimental results indicated that CF₄ was completely decomposed by water plasma, and recovery of fluorine can be achieved more than 99%. Influence of factors such as arc current and additive flow rate of O₂ on CF₄ decomposition was determined. Furthermore, the decomposition mechanism of CF₄ was investigated from chemical kinetics consideration. CF_{x (x: 1-4)} was thermally decomposed above 4000 K, oxidized in the temperature range of 4000-2400 K, and removed by H radical at temperatures below 2400 K.

Original language	English
Pages (from-to)	929-935
Number of pages	7
Journal	Thin Solid Films
Volume	518
Issue number	3
DOIs	https://doi.org/10.1016/j.tsf.2009.07.164
Publication status	Published - Dec 30 2009
Externally published	Yes

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2009.07.164

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@article{9fb5bfaf1aec4f6a8d62c41c75134aab,

title = "Decomposition of tetrafluoromethane by water plasma generated under atmospheric pressure",

abstract = "Tetrafluoromethane (CF4) decomposition by water plasma generated under atmospheric pressure was investigated by means of thermodynamic analyses and experiments. Thermodynamic equilibrium calculations were performed between 300 and 6000 K at atmospheric pressure. Experimental results indicated that CF4 was completely decomposed by water plasma, and recovery of fluorine can be achieved more than 99%. Influence of factors such as arc current and additive flow rate of O2 on CF4 decomposition was determined. Furthermore, the decomposition mechanism of CF4 was investigated from chemical kinetics consideration. CFx (x: 1-4) was thermally decomposed above 4000 K, oxidized in the temperature range of 4000-2400 K, and removed by H radical at temperatures below 2400 K.",

author = "Narengerile and Hironori Saito and Takayuki Watanabe",

year = "2009",

month = dec,

day = "30",

doi = "10.1016/j.tsf.2009.07.164",

language = "English",

volume = "518",

pages = "929--935",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "3",

}

TY - JOUR

T1 - Decomposition of tetrafluoromethane by water plasma generated under atmospheric pressure

AU - Narengerile,

AU - Saito, Hironori

AU - Watanabe, Takayuki

PY - 2009/12/30

Y1 - 2009/12/30

N2 - Tetrafluoromethane (CF4) decomposition by water plasma generated under atmospheric pressure was investigated by means of thermodynamic analyses and experiments. Thermodynamic equilibrium calculations were performed between 300 and 6000 K at atmospheric pressure. Experimental results indicated that CF4 was completely decomposed by water plasma, and recovery of fluorine can be achieved more than 99%. Influence of factors such as arc current and additive flow rate of O2 on CF4 decomposition was determined. Furthermore, the decomposition mechanism of CF4 was investigated from chemical kinetics consideration. CFx (x: 1-4) was thermally decomposed above 4000 K, oxidized in the temperature range of 4000-2400 K, and removed by H radical at temperatures below 2400 K.

AB - Tetrafluoromethane (CF4) decomposition by water plasma generated under atmospheric pressure was investigated by means of thermodynamic analyses and experiments. Thermodynamic equilibrium calculations were performed between 300 and 6000 K at atmospheric pressure. Experimental results indicated that CF4 was completely decomposed by water plasma, and recovery of fluorine can be achieved more than 99%. Influence of factors such as arc current and additive flow rate of O2 on CF4 decomposition was determined. Furthermore, the decomposition mechanism of CF4 was investigated from chemical kinetics consideration. CFx (x: 1-4) was thermally decomposed above 4000 K, oxidized in the temperature range of 4000-2400 K, and removed by H radical at temperatures below 2400 K.

UR - http://www.scopus.com/inward/record.url?scp=70350495209&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=70350495209&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2009.07.164

DO - 10.1016/j.tsf.2009.07.164

M3 - Article

AN - SCOPUS:70350495209

SN - 0040-6090

VL - 518

SP - 929

EP - 935

JO - Thin Solid Films

JF - Thin Solid Films

IS - 3

ER -

Decomposition of tetrafluoromethane by water plasma generated under atmospheric pressure

Abstract

All Science Journal Classification (ASJC) codes

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