TY - JOUR
T1 - Decomposition of volatile organic compounds at low concentrations using combination of densification by zeolite adsorption and dielectric barrier Discharge
AU - Yamagata, Yukihiko
AU - Niho, Kouichiro
AU - Inoue, Kouji
AU - Okano, Hiroshi
AU - Muraoka, Katsunori
PY - 2006/10/21
Y1 - 2006/10/21
N2 - The decomposition of toluene at very low concentrations (10-20ppm) using a combination of densification by zeolite adsorption and dielectric barrier discharge (DBD) was investigated. The characteristics of toluene decomposition using DBD under open and closed-loop flow conditions were determined. Under the closed-loop gas flow condition, a high decomposition ratio (70-93%) and a high energy efficiency [8-19g/(kWh)] were achieved for the adsorbed toluene (63% of the initial amount) by DBD treatment even at a high flow rate of 150L/min. Also, by the periodic operation of adsorption/DBD treatment, it was demonstrated that DBD treatment regenerated the honeycomb sheet containing zeolites for subsequent adsorption. The usefulness of this method for the decomposition of hazardous materials at low concentrations was shown.
AB - The decomposition of toluene at very low concentrations (10-20ppm) using a combination of densification by zeolite adsorption and dielectric barrier discharge (DBD) was investigated. The characteristics of toluene decomposition using DBD under open and closed-loop flow conditions were determined. Under the closed-loop gas flow condition, a high decomposition ratio (70-93%) and a high energy efficiency [8-19g/(kWh)] were achieved for the adsorbed toluene (63% of the initial amount) by DBD treatment even at a high flow rate of 150L/min. Also, by the periodic operation of adsorption/DBD treatment, it was demonstrated that DBD treatment regenerated the honeycomb sheet containing zeolites for subsequent adsorption. The usefulness of this method for the decomposition of hazardous materials at low concentrations was shown.
UR - http://www.scopus.com/inward/record.url?scp=34249984597&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=34249984597&partnerID=8YFLogxK
U2 - 10.1143/JJAP.45.8251
DO - 10.1143/JJAP.45.8251
M3 - Article
AN - SCOPUS:34249984597
SN - 0021-4922
VL - 45
SP - 8251
EP - 8254
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 10 B
ER -