Delocalization corrections using a disordered structure for atom location by channelling-enhanced microanalysis in the Ni-Al system

Zenji Horita, H. Kuninaka, T. Sano, M. Nemoto, J. C.H. Spence

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

A correction procedure for the delocalization effect when determining the site occupancy of an impurity element by atom location by channelling-enhanced microanalysis is proposed. The procedure utilizes a disordered structure with a composition similar to the ordered structure. Correction factors are derived by illuminating a sample with a disordered structure in the same orientation as for the ordered structure. The correction procedure is applied to a determination of the Ti occupancy in a Ni3Al intermetallic compound.

Original languageEnglish
Pages (from-to)425-432
Number of pages8
JournalPhilosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties
Volume67
Issue number2
DOIs
Publication statusPublished - Jan 1 1993

Fingerprint

Microanalysis
microanalysis
Atoms
Intermetallics
atoms
Impurities
illuminating
intermetallics
Chemical analysis
impurities

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Materials Science(all)
  • Condensed Matter Physics
  • Physics and Astronomy (miscellaneous)
  • Metals and Alloys

Cite this

Delocalization corrections using a disordered structure for atom location by channelling-enhanced microanalysis in the Ni-Al system. / Horita, Zenji; Kuninaka, H.; Sano, T.; Nemoto, M.; Spence, J. C.H.

In: Philosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties, Vol. 67, No. 2, 01.01.1993, p. 425-432.

Research output: Contribution to journalArticle

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