Abstract
We have studied the influence of electric field on plant growth. In previous papers, we reported that the D.C. electric field increases the seed germination rate, weight and length of daikon radish. We also obtain the similar effects for thale cress. It is reasonable to expect that there is an optimum intensity of D.C. electric field for plant growth improvement. As the first step to seek out the optimum intensity, the seeds of thale cress were cultivated under three circumstances; 0.0kV/m, 2.5kV/m, and 10.0kV/m of D.C. field. As a result, the growth is most increased by the 10.0kV/m; therefore, we estimated the optimum intensity to be higher than 2.5kV/m. In this paper, the detailed dependency of the growth of thale cress on the intensity of the D.C. electric field is studied.
| Original language | English |
|---|---|
| Article number | 6378769 |
| Pages (from-to) | 255-258 |
| Number of pages | 4 |
| Journal | Annual Report - Conference on Electrical Insulation and Dielectric Phenomena, CEIDP |
| DOIs | |
| Publication status | Published - 2012 |
| Externally published | Yes |
| Event | 2012 IEEE Conference on Electrical Insulation and Dielectric Phenomena, CEIDP 2012 - Montreal, QC, Canada Duration: Oct 14 2012 → Oct 17 2012 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering