Deposition of a-Si: H films by ECR plasma CVD using large diameter multi-slot antennae

Yoko Ueda, Hideaki Teranishi, Masayoshi Tanaka, Shunjiro Shinohara, Yoshinobu Kawai

    Research output: Contribution to journal › Article

    8 Citations (Scopus)

    Abstract

    A large diameter electron cyclotron resonance plasma was produced with a multi-slot antenna. The radial profile of the ion saturation current was examined as a function of input microwave power, gas pressure and magnetic mirror coil current to determine the experimental conditions necessary for a large diameter and uniform plasma at low pressure. Furthermore, the deposition of a-Si: H films was attempted onto 8 inch glass substrates using a gas mixture SiH4-10% He.

    Original languageEnglish
    Pages (from-to)503-507
    Number of pages5
    JournalSurface and Coatings Technology
    Volume74-75
    Issue numberPART 1
    DOIs
    Publication statusPublished - Sep 1995

    Fingerprint

    Plasma CVD
    slot antennas
    Slot antennas
    Magnetic mirrors
    vapor deposition
    Plasmas
    magnetic mirrors
    Electron cyclotron resonance
    electron cyclotron resonance
    Gas mixtures
    gas pressure
    gas mixtures
    coils
    low pressure
    Gases
    Microwaves
    Ions
    mirrors
    saturation
    microwaves

    All Science Journal Classification (ASJC) codes

    • Chemistry(all)
    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

    Cite this

    Deposition of a-Si : H films by ECR plasma CVD using large diameter multi-slot antennae. / Ueda, Yoko; Teranishi, Hideaki; Tanaka, Masayoshi; Shinohara, Shunjiro; Kawai, Yoshinobu.

    In: Surface and Coatings Technology, Vol. 74-75, No. PART 1, 09.1995, p. 503-507.

    Research output: Contribution to journal › Article

    Ueda, Y, Teranishi, H, Tanaka, M, Shinohara, S & Kawai, Y 1995, 'Deposition of a-Si: H films by ECR plasma CVD using large diameter multi-slot antennae', Surface and Coatings Technology, vol. 74-75, no. PART 1, pp. 503-507. https://doi.org/10.1016/0257-8972(95)08253-0
    Ueda Y, Teranishi H, Tanaka M, Shinohara S, Kawai Y. Deposition of a-Si: H films by ECR plasma CVD using large diameter multi-slot antennae. Surface and Coatings Technology. 1995 Sep;74-75(PART 1):503-507. https://doi.org/10.1016/0257-8972(95)08253-0
    Ueda, Yoko ; Teranishi, Hideaki ; Tanaka, Masayoshi ; Shinohara, Shunjiro ; Kawai, Yoshinobu. / Deposition of a-Si : H films by ECR plasma CVD using large diameter multi-slot antennae. In: Surface and Coatings Technology. 1995 ; Vol. 74-75, No. PART 1. pp. 503-507.
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