Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges

Kazunori Koga; Masaharu Shiratani; Yukio Watanabe

doi:10.1002/9783527629749.ch20

Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH⁴ Discharges

Kazunori Koga, Masaharu Shiratani, Yukio Watanabe

Research output: Chapter in Book/Report/Conference proceeding › Chapter

Original language	English
Title of host publication	Industrial Plasma Technology
Subtitle of host publication	Applications from Environmental to Energy Technologies
Publisher	Wiley-VCH
Pages	247-257
Number of pages	11
ISBN (Print)	9783527325443
DOIs	https://doi.org/10.1002/9783527629749.ch20
Publication status	Published - Oct 7 2010

All Science Journal Classification (ASJC) codes

Materials Science(all)

Access to Document

10.1002/9783527629749.ch20

Cite this

Deposition of a-Si : H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH⁴ Discharges. / Koga, Kazunori ; Shiratani, Masaharu; Watanabe, Yukio.

Industrial Plasma Technology: Applications from Environmental to Energy Technologies. Wiley-VCH, 2010. p. 247-257.

Research output: Chapter in Book/Report/Conference proceeding › Chapter

@inbook{a11ead5ae56c4e72a96bd40ce069b119,

title = "Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges",

author = "Kazunori Koga and Masaharu Shiratani and Yukio Watanabe",

year = "2010",

month = oct,

day = "7",

doi = "10.1002/9783527629749.ch20",

language = "English",

isbn = "9783527325443",

pages = "247--257",

booktitle = "Industrial Plasma Technology",

publisher = "Wiley-VCH",

}

TY - CHAP

T1 - Deposition of a-Si

T2 - H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges

AU - Koga, Kazunori

AU - Shiratani, Masaharu

AU - Watanabe, Yukio

PY - 2010/10/7

Y1 - 2010/10/7

UR - http://www.scopus.com/inward/record.url?scp=84864854320&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84864854320&partnerID=8YFLogxK

U2 - 10.1002/9783527629749.ch20

DO - 10.1002/9783527629749.ch20

M3 - Chapter

AN - SCOPUS:84864854320

SN - 9783527325443

SP - 247

EP - 257

BT - Industrial Plasma Technology

PB - Wiley-VCH

ER -

Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Cite this

Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH⁴ Discharges