Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Citation (Scopus)
Original languageEnglish
Title of host publicationIndustrial Plasma Technology
Subtitle of host publicationApplications from Environmental to Energy Technologies
PublisherWiley-VCH
Pages247-257
Number of pages11
ISBN (Print)9783527325443
DOIs
Publication statusPublished - Oct 7 2010

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Defect density
Amorphous silicon
Nanoparticles

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Cite this

Deposition of a-Si : H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges. / Koga, Kazunori; Shiratani, Masaharu; Watanabe, Yukio.

Industrial Plasma Technology: Applications from Environmental to Energy Technologies. Wiley-VCH, 2010. p. 247-257.

Research output: Chapter in Book/Report/Conference proceedingChapter

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