Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Citation (Scopus)
Original languageEnglish
Title of host publicationIndustrial Plasma Technology
Subtitle of host publicationApplications from Environmental to Energy Technologies
Number of pages11
ISBN (Print)9783527325443
Publication statusPublished - Oct 7 2010

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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