Deposition of amorphous hydrogenated carbon films on Si and PMMA by pulsed direct-current plasma CVD

Ta Lun Sung, Yu An Chao, Chung Ming Liu, Kungen Tsutsui, Shinriki Teii, Chun Yao Hsu

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

A pulse-modulated direct-current methane plasma is used to deposit amorphous hydrogenated carbon (a-C:H) films on Si and polymethyl methacrylate (PMMA) substrates. The structure and mechanical properties of the films are examined by applying a negative pulse bias voltage of 0.5 to 3 kV to the substrate at a pulse bias period of 100 to 200 μs. The deposition rate on both Si and PMMA increases with increasing the net input power, independent of the pulse period. The Raman spectra demonstrate that the films on Si are diamond-like carbon (DLC), while those on PMMA are polymer-like or soft amorphous carbon because of higher crystallinity of the sp2 phase and lower nanoscale hardness. The residual compressive stress of the films on PMMA is constantly low ranging from 0 to 2 GPa due exclusively to high flexibility of PMMA, which causes the easy relief of the stress and thus the density decrease in the films.

Original languageEnglish
Pages (from-to)6688-6692
Number of pages5
JournalThin Solid Films
Volume519
Issue number20
DOIs
Publication statusPublished - Aug 1 2011

Fingerprint

Plasma CVD
Carbon films
Polymethyl Methacrylate
Polymethyl methacrylates
polymethyl methacrylate
direct current
vapor deposition
carbon
pulses
Carbon
Diamond
Amorphous carbon
Methane
Substrates
Bias voltage
Deposition rates
Compressive stress
Raman scattering
Residual stresses
Diamonds

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Deposition of amorphous hydrogenated carbon films on Si and PMMA by pulsed direct-current plasma CVD. / Sung, Ta Lun; Chao, Yu An; Liu, Chung Ming; Tsutsui, Kungen; Teii, Shinriki; Hsu, Chun Yao.

In: Thin Solid Films, Vol. 519, No. 20, 01.08.2011, p. 6688-6692.

Research output: Contribution to journalArticle

Sung, Ta Lun ; Chao, Yu An ; Liu, Chung Ming ; Tsutsui, Kungen ; Teii, Shinriki ; Hsu, Chun Yao. / Deposition of amorphous hydrogenated carbon films on Si and PMMA by pulsed direct-current plasma CVD. In: Thin Solid Films. 2011 ; Vol. 519, No. 20. pp. 6688-6692.
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