Deposition of amorphous hydrogenated carbon films on Si and PMMA by pulsed direct-current plasma CVD

Physics

• Pulses 80%
• Substrates 40%
• Deposition 40%
• Increasing 20%
• Crystallinity 20%
• Strength of Materials 20%
• Electric Potential 20%
• Plasma Current 20%
• Flexibility 20%
• Hardness 20%
• Nanoscale 20%
• Deposits 20%
• Methane 20%
• Raman Spectra 20%

Material Science

• Liquid Films 100%
• Amorphous Hydrogenated Carbon 40%
• Mechanical Property 20%
• Density 20%
• Chemical Vapor Deposition 20%
• Polymer 20%
• Hardness 20%
• Diamond-Like Carbon 20%
• Carbon Films 20%
• Amorphous Carbon 20%