Deposition of cluster-free b-doped hydrogenated amorphous silicon films using sih 4+b10h1 4 multi-hollow discharge plasma chemical vapor deposition

Kazunori Koga, Kenta Nakahara, Yeon Won Kim, Takeaki Matsunaga, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani

Research output: Contribution to journalArticlepeer-review

Abstract

We have deposited cluster-free B-doped hydrogenated amorphous silicon (a-Si:H) films using a SiH4+B10H14 multi-hollow discharge plasma chemical vapor deposition (CVD) method. We have studied the dependence of the deposition rate, band gap, and conductivity of the films on the gas flow rate ratio R =B 10H 14)=SiH 4. The deposition rate for SiH4+B10H14 plasmas is 2-3 times as high as that for pure SiH4 plasmas. Optical emission spectroscopy (OES) measurements indicate that SiH3 radical generation rate remains nearly constant regardless of R. These results suggest that BxHy radicals enhance the surface reaction probability and/or sticking probability of SiH 3, being the predominant deposition precursor. Cluster-free B-doped a-Si:H films have a wide band-gap energy of 1.8-2.0 eV and a conductivity as high as 5:0 × 10 -6 S/cm. These results demonstrate that cluster-free B-doped a-Si:H films deposited using SiH4+B10H14 multi-hollow discharge plasma CVD are promising as a p-layer of pin a-Si:H solar cells.

Original languageEnglish
Article number01AD03
JournalJapanese Journal of Applied Physics
Volume51
Issue number1 PART 2
DOIs
Publication statusPublished - Jan 1 2012

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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