Deposition of cluster-free b-doped hydrogenated amorphous silicon films using sih 4+b10h1 4 multi-hollow discharge plasma chemical vapor deposition

Kazunori Koga, Kenta Nakahara, Yeon Won Kim, Takeaki Matsunaga, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani

Research output: Contribution to journalArticlepeer-review

Fingerprint

Dive into the research topics of 'Deposition of cluster-free b-doped hydrogenated amorphous silicon films using sih <sub>4</sub>+b10h1 <sub>4</sub> multi-hollow discharge plasma chemical vapor deposition'. Together they form a unique fingerprint.

Physics & Astronomy

Engineering & Materials Science