Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method

D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Research output: Contribution to journalConference article

3 Citations (Scopus)

Abstract

We report here deposition of crystalline Ge nanoparticle films using a radio frequency magnetron sputtering method in argon and hydrogen gas mixture under a high pressure condition. The size of Ge nanoparticles is deduced to be 6.3-6.4 nm from the peak frequency shift of Raman spectra. Raman and X-ray diffraction spectra show that the films are crystalline. The film crystallinity strongly depends on substrate temperature (Ts). Highly crystalline Ge nanoparticle films are successfully fabricated at Ts 180°C.

Original languageEnglish
Article number012002
JournalJournal of Physics: Conference Series
Volume518
Issue number1
DOIs
Publication statusPublished - Jan 1 2014
Event26th Symposium on Plasma Sciences for Materials, SPSM 2013 - Fukuoka, Japan
Duration: Sep 23 2013Sep 24 2013

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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