Deposition of high-quality a-Si:H by suppressing growth of a-Si clusters in SiH4 plasmas

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The density of Si-particles in a small size range below 10nm (referred to as clusters) in SiH4 capacitively-coupled high-frequency discharges amounts to 1011cm-3 even under deposition conditions of device-quality a-Si:H films. The results reported until now regarding the growth of such clusters are shown to be reasonably understood by taking into account the effects of gas flow on the growth. The SiH2 bond formation in the a-Si films are found to be mainly contributed by incorporation of large clusters (clusters in a range above about 0.5 nm in size) rather than higher-order-silane (HOS) radicals [SinHx (n<5, x<2n+2)] in the plasma. By employing the cluster-suppressed plasma CVD reactors, the remarkable decrease in SiH2 bond density in the films is realized, leading to the deposition of a-Si:H films of less light-induced degradation. Based on the knowledge of cluster growth obtained until now, the reactor with a potentiality of high rate deposition of high-quality films is proposed and its preliminary results are presented.

Original languageEnglish
Title of host publicationNEW VISTAS IN DUSTY PLASMAS
Subtitle of host publicationFourth International Conference on the Physics of Dusty Plasmas
Pages105-114
Number of pages10
DOIs
Publication statusPublished - Oct 31 2005
Event4th International Conference on the Physics of Dusty Plasmas - Orleans, France
Duration: Jun 13 2005Jun 17 2005

Publication series

NameAIP Conference Proceedings
Volume799
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Other

Other4th International Conference on the Physics of Dusty Plasmas
CountryFrance
CityOrleans
Period6/13/056/17/05

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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    Watanabe, Y., Shiratani, M., & Koga, K. (2005). Deposition of high-quality a-Si:H by suppressing growth of a-Si clusters in SiH4 plasmas. In NEW VISTAS IN DUSTY PLASMAS: Fourth International Conference on the Physics of Dusty Plasmas (pp. 105-114). (AIP Conference Proceedings; Vol. 799). https://doi.org/10.1063/1.2134578