Deposition of hydrophilic amorphous carbon film with ether as a source molecule and analysis of its deposition reaction

Masanori Shinohara, Taisuke Tominaga, Hayato Shimomura, Takeshi Ihara, Yoshihito Yagyu, Tamiko Ohshima, Hiroharu Kawasaki

Research output: Contribution to journalArticlepeer-review

Abstract

A hydrophilic amorphous carbon film was deposited with plasma enhanced chemical vapor deposition (PECVD) using diisopropylether ((i-C3H7)2O) as a source molecule. Bonding states of hydrocarbon in the deposited film are comprised of sp3-hydrocarbon components, which is the same as the isopropy group in the source molecule. On the other hand, C=O bonding is formed in the deposited film, not as similar to the source molecule, diisopropylether. These results suggest that C-O-C in the source molecule would be cleaved. This study would propose a new deposition method of a hydrophilic amorphous carbon film with ether as a source molecule.

Original languageEnglish
Pages (from-to)538-543
Number of pages6
JournalIEEJ Transactions on Fundamentals and Materials
Volume138
Issue number11
DOIs
Publication statusPublished - 2018
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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