TY - JOUR
T1 - Deposition of hydrophilic amorphous carbon film with ether as a source molecule and analysis of its deposition reaction
AU - Shinohara, Masanori
AU - Tominaga, Taisuke
AU - Shimomura, Hayato
AU - Ihara, Takeshi
AU - Yagyu, Yoshihito
AU - Ohshima, Tamiko
AU - Kawasaki, Hiroharu
N1 - Publisher Copyright:
© 2018 The Institute of Electrical Engineers of Japan.
PY - 2018
Y1 - 2018
N2 - A hydrophilic amorphous carbon film was deposited with plasma enhanced chemical vapor deposition (PECVD) using diisopropylether ((i-C3H7)2O) as a source molecule. Bonding states of hydrocarbon in the deposited film are comprised of sp3-hydrocarbon components, which is the same as the isopropy group in the source molecule. On the other hand, C=O bonding is formed in the deposited film, not as similar to the source molecule, diisopropylether. These results suggest that C-O-C in the source molecule would be cleaved. This study would propose a new deposition method of a hydrophilic amorphous carbon film with ether as a source molecule.
AB - A hydrophilic amorphous carbon film was deposited with plasma enhanced chemical vapor deposition (PECVD) using diisopropylether ((i-C3H7)2O) as a source molecule. Bonding states of hydrocarbon in the deposited film are comprised of sp3-hydrocarbon components, which is the same as the isopropy group in the source molecule. On the other hand, C=O bonding is formed in the deposited film, not as similar to the source molecule, diisopropylether. These results suggest that C-O-C in the source molecule would be cleaved. This study would propose a new deposition method of a hydrophilic amorphous carbon film with ether as a source molecule.
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U2 - 10.1541/ieejfms.138.538
DO - 10.1541/ieejfms.138.538
M3 - Article
AN - SCOPUS:85055998986
SN - 0385-4205
VL - 138
SP - 538
EP - 543
JO - IEEJ Transactions on Fundamentals and Materials
JF - IEEJ Transactions on Fundamentals and Materials
IS - 11
ER -