Deposition of hydrophilic amorphous carbon film with ether as a source molecule and analysis of its deposition reaction

Masanori Shinohara, Taisuke Tominaga, Hayato Shimomura, Takeshi Ihara, Yoshihito Yagyu, Tamiko Ohshima, Hiroharu Kawasaki

Research output: Contribution to journalArticlepeer-review

Abstract

A hydrophilic amorphous carbon film was deposited with plasma-enhanced chemical vapor deposition using diisopropylether ((i-C 3 H 7 ) 2 O) as a source molecule. Bonding states of hydrocarbon in the deposited film are comprised of sp 3 -hydrocarbon components, which is the same as the isopropyl group in the source molecule. On the other hand, C═O bonding is formed in the deposited film, not as similar to the source molecule, diisopropylether. These results suggest that C─O─C in the source molecule would be cleaved. This study would propose a new deposition method of a hydrophilic amorphous carbon film with ether as a source molecule.

Original languageEnglish
Pages (from-to)3-9
Number of pages7
JournalElectronics and Communications in Japan
Volume102
Issue number4
DOIs
Publication statusPublished - Apr 2019
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Signal Processing
  • Physics and Astronomy(all)
  • Computer Networks and Communications
  • Electrical and Electronic Engineering
  • Applied Mathematics

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