Deposition of smooth thin Cu films in deep submicron trench by plasma CVD reactor with H atom source

M. Shiratani, Jie Jin Hong Jie Jin, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)

Fingerprint

Dive into the research topics of 'Deposition of smooth thin Cu films in deep submicron trench by plasma CVD reactor with H atom source'. Together they form a unique fingerprint.

Chemistry

Physics

Engineering

Material Science