Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD

Takeaki Matsunaga, Yuki Kawashima, Kazunori Koga, Kenta Nakahara, William Makoto Nakamura, Giichiro Uchida, Naho Itagaki, Daisuke Yamashita, Hidefumi Matsuzaki, Masaharu Shiratani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science