Deposits removal and hydrogen release on co-deposited films exposed to O-ICR and O-GDC plasmas in HT-7

J. S. Hu, J. G. Li, N. Ashikawa, K. Tokunaga, N. Noda, N. Yoshida

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

A few new results of oxidation wall conditionings for deposits removal and hydrogen release were directly obtained on exposure of co-deposited films to O-ICR or O-GDC plasmas in HT-7. After the O-ICR or O-GDC treatments, the deposits were partially removed and deuterium retention was reduced. D 2 release from samples was reduced by a factor of 2-3, and the ratio of D/C decreased whereas that of O/C increased. The removal rates of C in various oxidation wall conditionings were about 1018-1019C m-2 min-1, which approached the estimated carbon deposited rates, of about 5.2 × 1018C m-2 min -1, on the tested samples. The He/O-ICR was more effective on the deposits removal and hydrogen (deuterium) release than O-GDC. And O-ICR was more effective on the surface facing main plasma than on that facing SOL plasma, whereas O-GDC possibly has uniform effectivity on both tested surfaces.

Original languageEnglish
Article number006
Pages (from-to)421-434
Number of pages14
JournalPlasma Physics and Controlled Fusion
Volume49
Issue number4
DOIs
Publication statusPublished - Apr 1 2007

All Science Journal Classification (ASJC) codes

  • Nuclear Energy and Engineering
  • Condensed Matter Physics

Fingerprint Dive into the research topics of 'Deposits removal and hydrogen release on co-deposited films exposed to O-ICR and O-GDC plasmas in HT-7'. Together they form a unique fingerprint.

  • Cite this