Determination of Osmium and Osmium Isotope Ratios by Microelectrothermal Vaporization Inductively Coupled Plasma Mass Spectrometry

Takafumi Hirata, Tasuku Akagi, Hiroshi Shimizu, Akimasa Masuda

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Abstract

A new merging introduction technique has been developed for Os analysis with inductively coupled plasma mass spectrometry (ICP-MS). The sample was placed in a microheater cell in a merging chamber and vaporized OsO4 was carried to the ICP with a blank matrix mist flow sprayed from a nebulizer. In the merging introduction, the best operational parameters could be obtained by the usual optimization using a standard solution. The 187Os/186Os ratio and the Os abundance were measured simultaneously by spiking 192Os. The precisions of the ratio and abundance measurements using 0.8 ng of Os were 5 and 4%, respectively. The detection limit of Os by this method was lower than 100 fg, which is almost one-tweifth of that obtained by conventional nebulization introduction.

Original languageEnglish
Pages (from-to)2263-2266
Number of pages4
JournalAnalytical Chemistry
Volume61
Issue number20
DOIs
Publication statusPublished - Jan 1 1989
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Analytical Chemistry

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