Determination of the c(2 × 2) structure formed on Cu(001) upon Li adsorption: a low-energy electron diffraction analysis

Seigi Mizuno, Hiroshi Tochihara, Takaaki Kawamura

Research output: Contribution to journalArticle

33 Citations (Scopus)

Abstract

We have determined the c(2 × 2) structure formed on Cu(001) upon Li adsorption at 180 K by low-energy electron diffraction analysis. It is found that an overlayer of Li atoms sitting on the fourfold hollow sites (coverage 0.5) is preferred with a Cu-Li interlayer spacing of 1.96 ± 0.08 Å. The radius of the Li atom is 92% of the Li metallic one. The interlayer spacing between the first and second layers of Cu(001) is 1.81 ± 0.04 Å, and this is the same value of spacing of the clean Cu(001) surface.

Original languageEnglish
Pages (from-to)239-245
Number of pages7
JournalSurface Science
Volume293
Issue number3
DOIs
Publication statusPublished - Aug 20 1993
Externally publishedYes

Fingerprint

Low energy electron diffraction
electron diffraction
spacing
Adsorption
Atoms
adsorption
interlayers
atoms
energy
hollow
radii

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Determination of the c(2 × 2) structure formed on Cu(001) upon Li adsorption : a low-energy electron diffraction analysis. / Mizuno, Seigi; Tochihara, Hiroshi; Kawamura, Takaaki.

In: Surface Science, Vol. 293, No. 3, 20.08.1993, p. 239-245.

Research output: Contribution to journalArticle

@article{44f283f047bd49cbb09466dc0696a1d6,
title = "Determination of the c(2 × 2) structure formed on Cu(001) upon Li adsorption: a low-energy electron diffraction analysis",
abstract = "We have determined the c(2 × 2) structure formed on Cu(001) upon Li adsorption at 180 K by low-energy electron diffraction analysis. It is found that an overlayer of Li atoms sitting on the fourfold hollow sites (coverage 0.5) is preferred with a Cu-Li interlayer spacing of 1.96 ± 0.08 {\AA}. The radius of the Li atom is 92{\%} of the Li metallic one. The interlayer spacing between the first and second layers of Cu(001) is 1.81 ± 0.04 {\AA}, and this is the same value of spacing of the clean Cu(001) surface.",
author = "Seigi Mizuno and Hiroshi Tochihara and Takaaki Kawamura",
year = "1993",
month = "8",
day = "20",
doi = "10.1016/0039-6028(93)90317-D",
language = "English",
volume = "293",
pages = "239--245",
journal = "Surface Science",
issn = "0039-6028",
publisher = "Elsevier",
number = "3",

}

TY - JOUR

T1 - Determination of the c(2 × 2) structure formed on Cu(001) upon Li adsorption

T2 - a low-energy electron diffraction analysis

AU - Mizuno, Seigi

AU - Tochihara, Hiroshi

AU - Kawamura, Takaaki

PY - 1993/8/20

Y1 - 1993/8/20

N2 - We have determined the c(2 × 2) structure formed on Cu(001) upon Li adsorption at 180 K by low-energy electron diffraction analysis. It is found that an overlayer of Li atoms sitting on the fourfold hollow sites (coverage 0.5) is preferred with a Cu-Li interlayer spacing of 1.96 ± 0.08 Å. The radius of the Li atom is 92% of the Li metallic one. The interlayer spacing between the first and second layers of Cu(001) is 1.81 ± 0.04 Å, and this is the same value of spacing of the clean Cu(001) surface.

AB - We have determined the c(2 × 2) structure formed on Cu(001) upon Li adsorption at 180 K by low-energy electron diffraction analysis. It is found that an overlayer of Li atoms sitting on the fourfold hollow sites (coverage 0.5) is preferred with a Cu-Li interlayer spacing of 1.96 ± 0.08 Å. The radius of the Li atom is 92% of the Li metallic one. The interlayer spacing between the first and second layers of Cu(001) is 1.81 ± 0.04 Å, and this is the same value of spacing of the clean Cu(001) surface.

UR - http://www.scopus.com/inward/record.url?scp=0027642127&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0027642127&partnerID=8YFLogxK

U2 - 10.1016/0039-6028(93)90317-D

DO - 10.1016/0039-6028(93)90317-D

M3 - Article

AN - SCOPUS:0027642127

VL - 293

SP - 239

EP - 245

JO - Surface Science

JF - Surface Science

SN - 0039-6028

IS - 3

ER -