Developing controllable anisotropic wet etching to achieve silicon nanorods, nanopencils and nanocones for efficient photon trapping

Hao Lin, Ho Yuen Cheung, Fei Xiu, Fengyun Wang, Senpo Yip, Ning Han, Takfu Hung, Jun Zhou, Johnny C. Ho, Chun Yuen Wong

Research output: Contribution to journalArticlepeer-review

65 Citations (Scopus)

Abstract

Controllable hierarchy of highly regular, single-crystalline nanorod, nanopencil and nanocone arrays with tunable geometry and etch anisotropy has been achieved over large areas (>1.5 cm × 1.5 cm) by using an [AgNO3 + HF + HNO3/H2O2] etching system. The etching mechanism has been elucidated to originate from the site-selective deposition of Ag nanoclusters. Different etch anisotropies and aspect ratios can be accomplished by modulating the relative concentration in the [AgNO3 + HF + HNO3/H2O2] etching system. Minimized optical reflectance is also demonstrated with the fabricated nano-arrays. Overall, this work highlights the technological potency of utilizing a simple wet-chemistry-only fabrication scheme, instead of reactive dry etching, to attain three-dimensional Si nanostructures with different geometrical morphologies for applications requiring large-scale, low-cost and efficient photon trapping (e.g. photovoltaics).

Original languageEnglish
Pages (from-to)9942-9946
Number of pages5
JournalJournal of Materials Chemistry A
Volume1
Issue number34
DOIs
Publication statusPublished - Sep 14 2013
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Renewable Energy, Sustainability and the Environment
  • Materials Science(all)

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