Development and progress in thin film Si photovoltaic technologies

I. Yoshida, T. Matsui, H. Sai, T. Suezaki, S. Nakao, K. Maejima, H. Katayama, M. Matsumoto, S. Sugiyama, Y. Takeuchi, M. Ushijima, K. Saito, M. Kondo, M. Tanaka, S. Nonomura, M. Shiratani, M. Konagai, M. Hirayama, S. Niki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Photovoltaic Power Generation Technology Research Association (PVTEC) has organized the consortium of one national research institute and five private companies, which has been supported technically by three universities. It has developed thin film Si PV technologies of improving conversion efficiency and developing a high-productivity Si deposition apparatus. For improving the conversion efficiency, the stabilized efficiency of 10.1% for an a-Si:H cell, 11.0% for a μc-Si cell, and 12.2% with light induced degradation ratio of less than 3% have been achieved, respectively. We have also successfully developed a plasma-enhanced chemical vapor deposition (PECVD) machine, which can deposit high-quality μc-Si films uniformly on a large-scale substrate with high deposition-rate by using very high frequency (VHF) plasma.

Original languageEnglish
Title of host publication2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages2832-2835
Number of pages4
ISBN (Electronic)9781479943982
DOIs
Publication statusPublished - Oct 15 2014
Event40th IEEE Photovoltaic Specialist Conference, PVSC 2014 - Denver, United States
Duration: Jun 8 2014Jun 13 2014

Publication series

Name2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014

Other

Other40th IEEE Photovoltaic Specialist Conference, PVSC 2014
CountryUnited States
CityDenver
Period6/8/146/13/14

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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