Development of a 2 kHz F2 laser for 157 nm lithography

Shinji Nagai, Kiwamu Takehisa, Tatsuo Enami, Toshihiro Nishisaka, Junichi Fujimoto, Osamu Wakabayashi, Hakaru Mizoguchi, Akihiko Takahashi

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

We have developed a 2kHz repetition rate discharge-pumped molecular fluorine laser oscillating at 157 nm. It has achieved an average power of 22 W at the repetition rate of 2kHz with a newly developed solid-state pulse power module which has a maximum input energy of 6 J/pulse. The multi-kilohertz F: laser is a key device for 157 nm lithography aimed at the design rule of below 0.10 microns.

Original languageEnglish
Pages (from-to)7013-7016
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume38
Issue number12 B
Publication statusPublished - Dec 1 1999

Fingerprint

Lithography
repetition
lithography
Lasers
pulses
Fluorine
lasers
fluorine
Laser pulses
solid state
energy

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Nagai, S., Takehisa, K., Enami, T., Nishisaka, T., Fujimoto, J., Wakabayashi, O., ... Takahashi, A. (1999). Development of a 2 kHz F2 laser for 157 nm lithography. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 38(12 B), 7013-7016.

Development of a 2 kHz F2 laser for 157 nm lithography. / Nagai, Shinji; Takehisa, Kiwamu; Enami, Tatsuo; Nishisaka, Toshihiro; Fujimoto, Junichi; Wakabayashi, Osamu; Mizoguchi, Hakaru; Takahashi, Akihiko.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 38, No. 12 B, 01.12.1999, p. 7013-7016.

Research output: Contribution to journalArticle

Nagai, S, Takehisa, K, Enami, T, Nishisaka, T, Fujimoto, J, Wakabayashi, O, Mizoguchi, H & Takahashi, A 1999, 'Development of a 2 kHz F2 laser for 157 nm lithography', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 38, no. 12 B, pp. 7013-7016.
Nagai S, Takehisa K, Enami T, Nishisaka T, Fujimoto J, Wakabayashi O et al. Development of a 2 kHz F2 laser for 157 nm lithography. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 1999 Dec 1;38(12 B):7013-7016.
Nagai, Shinji ; Takehisa, Kiwamu ; Enami, Tatsuo ; Nishisaka, Toshihiro ; Fujimoto, Junichi ; Wakabayashi, Osamu ; Mizoguchi, Hakaru ; Takahashi, Akihiko. / Development of a 2 kHz F2 laser for 157 nm lithography. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 1999 ; Vol. 38, No. 12 B. pp. 7013-7016.
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