We have developed a 2kHz repetition rate discharge-pumped molecular fluorine laser oscillating at 157 nm. It has achieved an average power of 22 W at the repetition rate of 2kHz with a newly developed solid-state pulse power module which has a maximum input energy of 6 J/pulse. The multi-kilohertz F: laser is a key device for 157 nm lithography aimed at the design rule of below 0.10 microns.
|Number of pages||4|
|Journal||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|Issue number||12 B|
|Publication status||Published - 1999|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)