Development of a 2 kHz F2 laser for 157 nm lithography

Shinji Nagai, Kiwamu Takehisa, Tatsuo Enami, Toshihiro Nishisaka, Junichi Fujimoto, Osamu Wakabayashi, Hakaru Mizoguchi, Akihiko Takahashi

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

We have developed a 2kHz repetition rate discharge-pumped molecular fluorine laser oscillating at 157 nm. It has achieved an average power of 22 W at the repetition rate of 2kHz with a newly developed solid-state pulse power module which has a maximum input energy of 6 J/pulse. The multi-kilohertz F: laser is a key device for 157 nm lithography aimed at the design rule of below 0.10 microns.

Original languageEnglish
Pages (from-to)7013-7016
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume38
Issue number12 B
DOIs
Publication statusPublished - 1999

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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