Development of a 915 MHz ECR plasma source

Yoshinobu Kawai; Kiichiro Uchino; Hiroshi Muta; Tobias Röwf

doi:10.1016/j.vacuum.2012.03.016

Development of a 915 MHz ECR plasma source

Yoshinobu Kawai, Kiichiro Uchino, Hiroshi Muta, Tobias Röwf

Electrical Engineering Sciences

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

We produced a 915 MHz ECR plasma with TM₀₁ microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

Original language	English
Pages (from-to)	123-127
Number of pages	5
Journal	Vacuum
Volume	87
DOIs	https://doi.org/10.1016/j.vacuum.2012.03.016
Publication status	Published - 2013

All Science Journal Classification (ASJC) codes

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

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title = "Development of a 915 MHz ECR plasma source",

abstract = "We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.",

author = "Yoshinobu Kawai and Kiichiro Uchino and Hiroshi Muta and Tobias R{\"o}wf",

year = "2013",

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AU - Kawai, Yoshinobu

AU - Uchino, Kiichiro

AU - Muta, Hiroshi

AU - Röwf, Tobias

PY - 2013

Y1 - 2013

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AB - We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

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