Development of a 915 MHz ECR plasma source

Yoshinobu Kawai; Kiichiro Uchino; Hiroshi Muta; Tobias Röwf

doi:10.1016/j.vacuum.2012.03.016

Development of a 915 MHz ECR plasma source

Yoshinobu Kawai, Kiichiro Uchino, Hiroshi Muta, Tobias Röwf

Electrical Engineering Sciences

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

We produced a 915 MHz ECR plasma with TM₀₁ microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

Original language	English
Pages (from-to)	123-127
Number of pages	5
Journal	Vacuum
Volume	87
DOIs	https://doi.org/10.1016/j.vacuum.2012.03.016
Publication status	Published - 2013

All Science Journal Classification (ASJC) codes

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

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10.1016/j.vacuum.2012.03.016

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title = "Development of a 915 MHz ECR plasma source",

abstract = "We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.",

author = "Yoshinobu Kawai and Kiichiro Uchino and Hiroshi Muta and Tobias R{\"o}wf",

year = "2013",

doi = "10.1016/j.vacuum.2012.03.016",

language = "English",

volume = "87",

pages = "123--127",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier Limited",

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TY - JOUR

T1 - Development of a 915 MHz ECR plasma source

AU - Kawai, Yoshinobu

AU - Uchino, Kiichiro

AU - Muta, Hiroshi

AU - Röwf, Tobias

PY - 2013

Y1 - 2013

N2 - We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

AB - We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

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UR - http://www.scopus.com/inward/citedby.url?scp=84891736582&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2012.03.016

DO - 10.1016/j.vacuum.2012.03.016

M3 - Article

AN - SCOPUS:84891736582

VL - 87

SP - 123

EP - 127

JO - Vacuum

JF - Vacuum

SN - 0042-207X

ER -

Development of a 915 MHz ECR plasma source

Abstract

All Science Journal Classification (ASJC) codes

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