Development of a 915 MHz ECR plasma source

Yoshinobu Kawai, Kiichiro Uchino, Hiroshi Muta, Tobias Röwf

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

Original languageEnglish
Pages (from-to)123-127
Number of pages5
JournalVacuum
Volume87
DOIs
Publication statusPublished - Jan 1 2013

Fingerprint

Plasma sources
Plasmas
Electron temperature
Magnetic flux
magnetic flux
density distribution
cut-off
flux density
Microwaves
electron energy
Ions
Magnetic fields
saturation
microwaves
profiles
magnetic fields
ions

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Instrumentation
  • Surfaces, Coatings and Films

Cite this

Development of a 915 MHz ECR plasma source. / Kawai, Yoshinobu; Uchino, Kiichiro; Muta, Hiroshi; Röwf, Tobias.

In: Vacuum, Vol. 87, 01.01.2013, p. 123-127.

Research output: Contribution to journalArticle

Kawai, Yoshinobu ; Uchino, Kiichiro ; Muta, Hiroshi ; Röwf, Tobias. / Development of a 915 MHz ECR plasma source. In: Vacuum. 2013 ; Vol. 87. pp. 123-127.
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