Development of a 915 MHz ECR plasma source

Yoshinobu Kawai, Kiichiro Uchino, Hiroshi Muta, Tobias Röwf

Research output: Contribution to journal › Article

5 Citations (Scopus)

Abstract

We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

Original languageEnglish
Pages (from-to)123-127
Number of pages5
JournalVacuum
Volume87
DOIs
Publication statusPublished - Jan 1 2013

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Plasma sources
Plasmas
Electron temperature
Magnetic flux
magnetic flux
density distribution
cut-off
flux density
Microwaves
electron energy
Ions
Magnetic fields
saturation
microwaves
profiles
magnetic fields
ions

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Instrumentation
  • Surfaces, Coatings and Films

Cite this

Development of a 915 MHz ECR plasma source. / Kawai, Yoshinobu; Uchino, Kiichiro; Muta, Hiroshi; Röwf, Tobias.

In: Vacuum, Vol. 87, 01.01.2013, p. 123-127.

Research output: Contribution to journal › Article

Kawai, Y, Uchino, K, Muta, H & Röwf, T 2013, 'Development of a 915 MHz ECR plasma source', Vacuum, vol. 87, pp. 123-127. https://doi.org/10.1016/j.vacuum.2012.03.016
Kawai Y, Uchino K, Muta H, Röwf T. Development of a 915 MHz ECR plasma source. Vacuum. 2013 Jan 1;87:123-127. https://doi.org/10.1016/j.vacuum.2012.03.016
Kawai, Yoshinobu ; Uchino, Kiichiro ; Muta, Hiroshi ; Röwf, Tobias. / Development of a 915 MHz ECR plasma source. In: Vacuum. 2013 ; Vol. 87. pp. 123-127.
@article{c679f686b5c44108b64ac404212d23d7,
title = "Development of a 915 MHz ECR plasma source",
abstract = "We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.",
author = "Yoshinobu Kawai and Kiichiro Uchino and Hiroshi Muta and Tobias R{\"o}wf",
year = "2013",
month = "1",
day = "1",
doi = "10.1016/j.vacuum.2012.03.016",
language = "English",
volume = "87",
pages = "123--127",
journal = "Vacuum",
issn = "0042-207X",
publisher = "Elsevier Limited",

}

TY - JOUR

T1 - Development of a 915 MHz ECR plasma source

AU - Kawai, Yoshinobu

AU - Uchino, Kiichiro

AU - Muta, Hiroshi

AU - Röwf, Tobias

PY - 2013/1/1

Y1 - 2013/1/1

N2 - We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

AB - We produced a 915 MHz ECR plasma with TM01 microwaves for different magnetic flux density distributions and examined the radial profiles of the ion saturation current as a function of pressure and power. It was found that the 915 MHz ECR plasma is uniform over 200 mm in diameter around the L-cutoff density and when a diverging magnetic field is used, a low electron temperature plasma is realized.

UR - http://www.scopus.com/inward/record.url?scp=84891736582&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84891736582&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2012.03.016

DO - 10.1016/j.vacuum.2012.03.016

M3 - Article

AN - SCOPUS:84891736582

VL - 87

SP - 123

EP - 127

JO - Vacuum

JF - Vacuum

SN - 0042-207X

ER -

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