@inproceedings{2f78ed79d6354d978c2635443db1b2dc,
title = "Development of a combinatorial plasma process analyzer for advanced R&D of next generation nanodevice fabrication",
abstract = "To develop a combinatorial plasma process analyzer in which the plasma distributions are finely controlled, we have carried out plasma-fluid simulations. The simulations show the feasibility of using low inductance antenna (LIA) modules to produce density-inclination plasmas. Numerically predicted plasma density profiles are generally in excellent agreement with experiments. A considerable inclination in plasma density was obtained using localized power deposition profiles. The results show that a variety of process results can be efficiently analyzed via the inclination distribution along the substrate for the process parameters.",
author = "Kosuke Takenaka and Ken Cho and Yuichi Setsuhara and Masaharu Shiratani and Makoto Sekine and Masaru Hon",
year = "2010",
doi = "10.1002/9780470917145.ch40",
language = "English",
isbn = "9780470909171",
series = "Ceramic Transactions",
publisher = "American Ceramic Society",
pages = "279--284",
booktitle = "Characterization and Control of Interfaces for High Quality Advanced Materials III - Proc. 3rd Int. Conf. on Characterization and Control of Interfaces for High Quality Advanced Materials,ICCCI2009",
address = "United States",
note = "3rd International Conference on Characterization and Control of Interfaces for High Quality Advanced Materials, ICCCI2009 ; Conference date: 06-09-2009 Through 09-09-2009",
}