Development of a target for laser-produced plasma EUV light source using Sn nano-particles

H. Tanaka, K. Akinaga, A. Takahashi, T. Okada

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

Nano-structured and tin-based targets have been fabricated by the pulsed-laser ablation method, in order to develop efficient and debris-free targets for the laser-produced plasma extreme ultraviolet (EUV) light source at 13.5 nm. Characteristic spectra that have the radiation peak around 13.5 nm were obtained from CO2 laser produced plasma using the films as a target. A nano-structured target produced EUV light as intense as a bulk target and a narrower line spectrum at 13.5 nm than a bulk target.

Original languageEnglish
Pages (from-to)1493-1495
Number of pages3
JournalApplied Physics A: Materials Science and Processing
Volume79
Issue number4-6
DOIs
Publication statusPublished - Jan 1 2004

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)

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