Development of adaptive mirror for wavefront correction of hard x-ray nanobeam

Takashi Kimura, Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Daisuke Yamakawa, Satoshi Matsuyama, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

We present the development of a phase compensator for wavefront control of X-rays. The optical device is a 150 mm-long total reflection mirror, the shape of which can be curved by adjusting the bias voltages of 36 piezoelectric ceramic plates attached to the mirror. The mirror surface was smoothed and made flat by elastic emission machining. To achieve a high degree of the accuracy in the controllability of a curved line, a Fizeau interferometer is placed in front of the mirror surface to monitor its shape in the experiment. We will apply this device to the optical system for the realization of sub-10-nm hard X-ray focusing.

Original languageEnglish
Title of host publicationAdvances in X-Ray/EUV Optics and Components III
DOIs
Publication statusPublished - Nov 21 2008
EventAdvances in X-Ray/EUV Optics and Components III - San Diego, CA, United States
Duration: Aug 11 2008Aug 13 2008

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7077
ISSN (Print)0277-786X

Other

OtherAdvances in X-Ray/EUV Optics and Components III
CountryUnited States
CitySan Diego, CA
Period8/11/088/13/08

Fingerprint

Wavefront Correction
Hard X-ray
Wavefronts
Mirror
Mirrors
mirrors
X rays
x rays
Fizeau Interferometer
Piezoelectric Ceramics
Optical Devices
Piezoelectric ceramics
piezoelectric ceramics
controllability
compensators
Compensator
Optical devices
Bias voltage
Controllability
Machining

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Kimura, T., Handa, S., Mimura, H., Yumoto, H., Yamakawa, D., Matsuyama, S., ... Yamauchi, K. (2008). Development of adaptive mirror for wavefront correction of hard x-ray nanobeam. In Advances in X-Ray/EUV Optics and Components III [707709] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7077). https://doi.org/10.1117/12.796029

Development of adaptive mirror for wavefront correction of hard x-ray nanobeam. / Kimura, Takashi; Handa, Soichiro; Mimura, Hidekazu; Yumoto, Hirokatsu; Yamakawa, Daisuke; Matsuyama, Satoshi; Sano, Yasuhisa; Tamasaku, Kenji; Nishino, Yoshinori; Yabashi, Makina; Ishikawa, Tetsuya; Yamauchi, Kazuto.

Advances in X-Ray/EUV Optics and Components III. 2008. 707709 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7077).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kimura, T, Handa, S, Mimura, H, Yumoto, H, Yamakawa, D, Matsuyama, S, Sano, Y, Tamasaku, K, Nishino, Y, Yabashi, M, Ishikawa, T & Yamauchi, K 2008, Development of adaptive mirror for wavefront correction of hard x-ray nanobeam. in Advances in X-Ray/EUV Optics and Components III., 707709, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7077, Advances in X-Ray/EUV Optics and Components III, San Diego, CA, United States, 8/11/08. https://doi.org/10.1117/12.796029
Kimura T, Handa S, Mimura H, Yumoto H, Yamakawa D, Matsuyama S et al. Development of adaptive mirror for wavefront correction of hard x-ray nanobeam. In Advances in X-Ray/EUV Optics and Components III. 2008. 707709. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.796029
Kimura, Takashi ; Handa, Soichiro ; Mimura, Hidekazu ; Yumoto, Hirokatsu ; Yamakawa, Daisuke ; Matsuyama, Satoshi ; Sano, Yasuhisa ; Tamasaku, Kenji ; Nishino, Yoshinori ; Yabashi, Makina ; Ishikawa, Tetsuya ; Yamauchi, Kazuto. / Development of adaptive mirror for wavefront correction of hard x-ray nanobeam. Advances in X-Ray/EUV Optics and Components III. 2008. (Proceedings of SPIE - The International Society for Optical Engineering).
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