Abstract
We present the development of a phase compensator for wavefront control of X-rays. The optical device is a 150 mm-long total reflection mirror, the shape of which can be curved by adjusting the bias voltages of 36 piezoelectric ceramic plates attached to the mirror. The mirror surface was smoothed and made flat by elastic emission machining. To achieve a high degree of the accuracy in the controllability of a curved line, a Fizeau interferometer is placed in front of the mirror surface to monitor its shape in the experiment. We will apply this device to the optical system for the realization of sub-10-nm hard X-ray focusing.
| Original language | English |
|---|---|
| Title of host publication | Advances in X-Ray/EUV Optics and Components III |
| DOIs | |
| Publication status | Published - Nov 21 2008 |
| Externally published | Yes |
| Event | Advances in X-Ray/EUV Optics and Components III - San Diego, CA, United States Duration: Aug 11 2008 → Aug 13 2008 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 7077 |
| ISSN (Print) | 0277-786X |
Other
| Other | Advances in X-Ray/EUV Optics and Components III |
|---|---|
| Country | United States |
| City | San Diego, CA |
| Period | 8/11/08 → 8/13/08 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering
Cite this
Development of adaptive mirror for wavefront correction of hard x-ray nanobeam. / Kimura, Takashi; Handa, Soichiro; Mimura, Hidekazu; Yumoto, Hirokatsu; Yamakawa, Daisuke; Matsuyama, Satoshi; Sano, Yasuhisa; Tamasaku, Kenji; Nishino, Yoshinori; Yabashi, Makina; Ishikawa, Tetsuya; Yamauchi, Kazuto.
Advances in X-Ray/EUV Optics and Components III. 2008. 707709 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7077).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Development of adaptive mirror for wavefront correction of hard x-ray nanobeam
AU - Kimura, Takashi
AU - Handa, Soichiro
AU - Mimura, Hidekazu
AU - Yumoto, Hirokatsu
AU - Yamakawa, Daisuke
AU - Matsuyama, Satoshi
AU - Sano, Yasuhisa
AU - Tamasaku, Kenji
AU - Nishino, Yoshinori
AU - Yabashi, Makina
AU - Ishikawa, Tetsuya
AU - Yamauchi, Kazuto
PY - 2008/11/21
Y1 - 2008/11/21
N2 - We present the development of a phase compensator for wavefront control of X-rays. The optical device is a 150 mm-long total reflection mirror, the shape of which can be curved by adjusting the bias voltages of 36 piezoelectric ceramic plates attached to the mirror. The mirror surface was smoothed and made flat by elastic emission machining. To achieve a high degree of the accuracy in the controllability of a curved line, a Fizeau interferometer is placed in front of the mirror surface to monitor its shape in the experiment. We will apply this device to the optical system for the realization of sub-10-nm hard X-ray focusing.
AB - We present the development of a phase compensator for wavefront control of X-rays. The optical device is a 150 mm-long total reflection mirror, the shape of which can be curved by adjusting the bias voltages of 36 piezoelectric ceramic plates attached to the mirror. The mirror surface was smoothed and made flat by elastic emission machining. To achieve a high degree of the accuracy in the controllability of a curved line, a Fizeau interferometer is placed in front of the mirror surface to monitor its shape in the experiment. We will apply this device to the optical system for the realization of sub-10-nm hard X-ray focusing.
UR - http://www.scopus.com/inward/record.url?scp=56249088628&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=56249088628&partnerID=8YFLogxK
U2 - 10.1117/12.796029
DO - 10.1117/12.796029
M3 - Conference contribution
AN - SCOPUS:56249088628
SN - 9780819472977
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in X-Ray/EUV Optics and Components III
ER -