Development of adaptive mirror for wavefront correction of hard x-ray nanobeam

Takashi Kimura, Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Daisuke Yamakawa, Satoshi Matsuyama, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)


We present the development of a phase compensator for wavefront control of X-rays. The optical device is a 150 mm-long total reflection mirror, the shape of which can be curved by adjusting the bias voltages of 36 piezoelectric ceramic plates attached to the mirror. The mirror surface was smoothed and made flat by elastic emission machining. To achieve a high degree of the accuracy in the controllability of a curved line, a Fizeau interferometer is placed in front of the mirror surface to monitor its shape in the experiment. We will apply this device to the optical system for the realization of sub-10-nm hard X-ray focusing.

Original languageEnglish
Title of host publicationAdvances in X-Ray/EUV Optics and Components III
Publication statusPublished - 2008
Externally publishedYes
EventAdvances in X-Ray/EUV Optics and Components III - San Diego, CA, United States
Duration: Aug 11 2008Aug 13 2008

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherAdvances in X-Ray/EUV Optics and Components III
CountryUnited States
CitySan Diego, CA

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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