Development of density-inclination plasmas for analysis of plasma nano-processes via combinatorial method

Yuichi Setsuhara, Katsuhisa Nagao, Masaharu Shiratani, Makoto Sekine, Masaru Hori

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We have developed a plasma-process analyzer based on the "combinatorial method", in which process examinations with a continuous variation of sample-preparation conditions can be carried out in one execution of experiment via placing substrates on a substrate holder with an inclined distribution of process parameters (ion flux and radical flux) and the distributions of particle fluxes are finely controlled and characterized via particle diagnostics. In the present study, plasma-fluid simulations have been performed to show the feasibility of the combinatorial plasma-process analyzer, in which density inclinations of the plasma parameters (ion density, radical density) are obtained via sustaining plasmas by localized deposition of discharge power using low-inductance antenna modules. The simulation results showed that density-inclination plasmas were feasible by localized power deposition for sustaining plasmas, indicating that a variety of process conditions can be efficiently analyzed via placing substrates on a substrate holder, along which process parameters are inclined.

Original languageEnglish
Pages (from-to)1020-1023
Number of pages4
JournalThin Solid Films
Volume518
Issue number3
DOIs
Publication statusPublished - Dec 30 2009

Fingerprint

Plasma density
inclination
Plasmas
Substrates
Fluxes
sustaining
holders
analyzers
Ions
Inductance
flux (rate)
inductance
Antennas
antennas
simulation
modules
examination
Fluids
preparation
fluids

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Development of density-inclination plasmas for analysis of plasma nano-processes via combinatorial method. / Setsuhara, Yuichi; Nagao, Katsuhisa; Shiratani, Masaharu; Sekine, Makoto; Hori, Masaru.

In: Thin Solid Films, Vol. 518, No. 3, 30.12.2009, p. 1020-1023.

Research output: Contribution to journalArticle

Setsuhara, Yuichi ; Nagao, Katsuhisa ; Shiratani, Masaharu ; Sekine, Makoto ; Hori, Masaru. / Development of density-inclination plasmas for analysis of plasma nano-processes via combinatorial method. In: Thin Solid Films. 2009 ; Vol. 518, No. 3. pp. 1020-1023.
@article{3ec7c113717449bda0538d0a9ef1aa87,
title = "Development of density-inclination plasmas for analysis of plasma nano-processes via combinatorial method",
abstract = "We have developed a plasma-process analyzer based on the {"}combinatorial method{"}, in which process examinations with a continuous variation of sample-preparation conditions can be carried out in one execution of experiment via placing substrates on a substrate holder with an inclined distribution of process parameters (ion flux and radical flux) and the distributions of particle fluxes are finely controlled and characterized via particle diagnostics. In the present study, plasma-fluid simulations have been performed to show the feasibility of the combinatorial plasma-process analyzer, in which density inclinations of the plasma parameters (ion density, radical density) are obtained via sustaining plasmas by localized deposition of discharge power using low-inductance antenna modules. The simulation results showed that density-inclination plasmas were feasible by localized power deposition for sustaining plasmas, indicating that a variety of process conditions can be efficiently analyzed via placing substrates on a substrate holder, along which process parameters are inclined.",
author = "Yuichi Setsuhara and Katsuhisa Nagao and Masaharu Shiratani and Makoto Sekine and Masaru Hori",
year = "2009",
month = "12",
day = "30",
doi = "10.1016/j.tsf.2009.07.162",
language = "English",
volume = "518",
pages = "1020--1023",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "3",

}

TY - JOUR

T1 - Development of density-inclination plasmas for analysis of plasma nano-processes via combinatorial method

AU - Setsuhara, Yuichi

AU - Nagao, Katsuhisa

AU - Shiratani, Masaharu

AU - Sekine, Makoto

AU - Hori, Masaru

PY - 2009/12/30

Y1 - 2009/12/30

N2 - We have developed a plasma-process analyzer based on the "combinatorial method", in which process examinations with a continuous variation of sample-preparation conditions can be carried out in one execution of experiment via placing substrates on a substrate holder with an inclined distribution of process parameters (ion flux and radical flux) and the distributions of particle fluxes are finely controlled and characterized via particle diagnostics. In the present study, plasma-fluid simulations have been performed to show the feasibility of the combinatorial plasma-process analyzer, in which density inclinations of the plasma parameters (ion density, radical density) are obtained via sustaining plasmas by localized deposition of discharge power using low-inductance antenna modules. The simulation results showed that density-inclination plasmas were feasible by localized power deposition for sustaining plasmas, indicating that a variety of process conditions can be efficiently analyzed via placing substrates on a substrate holder, along which process parameters are inclined.

AB - We have developed a plasma-process analyzer based on the "combinatorial method", in which process examinations with a continuous variation of sample-preparation conditions can be carried out in one execution of experiment via placing substrates on a substrate holder with an inclined distribution of process parameters (ion flux and radical flux) and the distributions of particle fluxes are finely controlled and characterized via particle diagnostics. In the present study, plasma-fluid simulations have been performed to show the feasibility of the combinatorial plasma-process analyzer, in which density inclinations of the plasma parameters (ion density, radical density) are obtained via sustaining plasmas by localized deposition of discharge power using low-inductance antenna modules. The simulation results showed that density-inclination plasmas were feasible by localized power deposition for sustaining plasmas, indicating that a variety of process conditions can be efficiently analyzed via placing substrates on a substrate holder, along which process parameters are inclined.

UR - http://www.scopus.com/inward/record.url?scp=70350506617&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=70350506617&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2009.07.162

DO - 10.1016/j.tsf.2009.07.162

M3 - Article

AN - SCOPUS:70350506617

VL - 518

SP - 1020

EP - 1023

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 3

ER -