To form a magnified hard X-ray image with a 50 nm resolution, we have studied total reflection mirror optics with two pairs of elliptical and hyperbolic mirrors, which is called "Advanced Kirkpatrick-Baez system". A designed optical system has 200x and 300x magnifications in vertical and horizontal directions. Also diffraction limit size in the optical system is 40nm×45nm. We fabricated a pair of elliptical and hyperbolic mirrors for horizontal imaging with a figure accuracy of 2 nm using elastic emission machining (EEM), microstitching interferometry (MSI) and relative-angle-determinable stitching interferometry (RADSI). One-dimensional tests for forming a demagnified image of a slit were carried out at an X-ray energy of 11.5 keV at BL29XUL (EH2) of SPring-8. As a result, a shape beam with a FWHM of 78 nm was observed. This demonstrates that we realized one-dimensional Wolter optics that has a spatial resolution of 78 nm.