Abstract
<p>In this research, we propose a new imprint process for multilayered material. The work sheet material is set onto an expanded rubber substrate, and in-plane compression is performed to the work sheet by the contraction of the rubber sheet. By imprinting on the multilayered material, it is possible not only to transcribe the surface pattern by the mold but also to form some patterns along interface. Further, by the proposed in-plane compression, an overhang shape and a high aspect ratio would be obtained, which are difficult for simple conventional imprinting. As a result of the experiment, it was possible to reduce the pitch of the imprinted material by compressing the imprinted material in-plane. We show some results of in-plane compressive imprint.</p>
| Translated title of the contribution | Development of imprint process with in-plane compression |
|---|---|
| Original language | Japanese |
| Pages (from-to) | 30pm4PN24 |
| Journal | マイクロ・ナノ工学シンポジウム |
| Volume | 2018 |
| Issue number | 0 |
| DOIs | |
| Publication status | Published - 2018 |