Development of large diameter ECR plasma source

Yoshinobu Kawai, Kiichiro Uchino, Hiroshi Muta, Shinji Kawai, Tobias Röwf

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

To develop ECR plasma source for industrial applications, we produced a large diameter ECR plasma and examined radial profiles of the ion saturation current as a function of pressure and power. It was found that ECR plasma uniform over 300 mm is produced for pressures higher than 1 mTorr and the electron temperature decreases with increasing pressures.

Original languageEnglish
Pages (from-to)1381-1384
Number of pages4
JournalVacuum
Volume84
Issue number12
DOIs
Publication statusPublished - Jun 25 2010

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Plasma sources
Plasmas
Electron temperature
Industrial applications
electron energy
Ions
saturation
profiles
ions

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

Kawai, Y., Uchino, K., Muta, H., Kawai, S., & Röwf, T. (2010). Development of large diameter ECR plasma source. Vacuum, 84(12), 1381-1384. https://doi.org/10.1016/j.vacuum.2009.12.023

Development of large diameter ECR plasma source. / Kawai, Yoshinobu; Uchino, Kiichiro; Muta, Hiroshi; Kawai, Shinji; Röwf, Tobias.

In: Vacuum, Vol. 84, No. 12, 25.06.2010, p. 1381-1384.

Research output: Contribution to journalArticle

Kawai, Y, Uchino, K, Muta, H, Kawai, S & Röwf, T 2010, 'Development of large diameter ECR plasma source', Vacuum, vol. 84, no. 12, pp. 1381-1384. https://doi.org/10.1016/j.vacuum.2009.12.023
Kawai, Yoshinobu ; Uchino, Kiichiro ; Muta, Hiroshi ; Kawai, Shinji ; Röwf, Tobias. / Development of large diameter ECR plasma source. In: Vacuum. 2010 ; Vol. 84, No. 12. pp. 1381-1384.
@article{83948a111db24e4bb5ce8e83eaebefc7,
title = "Development of large diameter ECR plasma source",
abstract = "To develop ECR plasma source for industrial applications, we produced a large diameter ECR plasma and examined radial profiles of the ion saturation current as a function of pressure and power. It was found that ECR plasma uniform over 300 mm is produced for pressures higher than 1 mTorr and the electron temperature decreases with increasing pressures.",
author = "Yoshinobu Kawai and Kiichiro Uchino and Hiroshi Muta and Shinji Kawai and Tobias R{\"o}wf",
year = "2010",
month = "6",
day = "25",
doi = "10.1016/j.vacuum.2009.12.023",
language = "English",
volume = "84",
pages = "1381--1384",
journal = "Vacuum",
issn = "0042-207X",
publisher = "Elsevier Limited",
number = "12",

}

TY - JOUR

T1 - Development of large diameter ECR plasma source

AU - Kawai, Yoshinobu

AU - Uchino, Kiichiro

AU - Muta, Hiroshi

AU - Kawai, Shinji

AU - Röwf, Tobias

PY - 2010/6/25

Y1 - 2010/6/25

N2 - To develop ECR plasma source for industrial applications, we produced a large diameter ECR plasma and examined radial profiles of the ion saturation current as a function of pressure and power. It was found that ECR plasma uniform over 300 mm is produced for pressures higher than 1 mTorr and the electron temperature decreases with increasing pressures.

AB - To develop ECR plasma source for industrial applications, we produced a large diameter ECR plasma and examined radial profiles of the ion saturation current as a function of pressure and power. It was found that ECR plasma uniform over 300 mm is produced for pressures higher than 1 mTorr and the electron temperature decreases with increasing pressures.

UR - http://www.scopus.com/inward/record.url?scp=77956455080&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77956455080&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2009.12.023

DO - 10.1016/j.vacuum.2009.12.023

M3 - Article

AN - SCOPUS:77956455080

VL - 84

SP - 1381

EP - 1384

JO - Vacuum

JF - Vacuum

SN - 0042-207X

IS - 12

ER -