Development of large diameter ECR plasma source

Yoshinobu Kawai, Kiichiro Uchino, Hiroshi Muta, Shinji Kawai, Tobias Röwf

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

To develop ECR plasma source for industrial applications, we produced a large diameter ECR plasma and examined radial profiles of the ion saturation current as a function of pressure and power. It was found that ECR plasma uniform over 300 mm is produced for pressures higher than 1 mTorr and the electron temperature decreases with increasing pressures.

Original languageEnglish
Pages (from-to)1381-1384
Number of pages4
JournalVacuum
Volume84
Issue number12
DOIs
Publication statusPublished - Jun 25 2010

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Development of large diameter ECR plasma source'. Together they form a unique fingerprint.

  • Cite this

    Kawai, Y., Uchino, K., Muta, H., Kawai, S., & Röwf, T. (2010). Development of large diameter ECR plasma source. Vacuum, 84(12), 1381-1384. https://doi.org/10.1016/j.vacuum.2009.12.023