Development of negative heavy ion sources for plasma potential measurement

M. Sasao, Y. Okabe, akihide fujisawa, J. Fujita, H. Yamaoka, M. Wada

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

A plasma sputter negative ion source was evaluated for its applicability for measuring the plasma potentials in fusion devices. Both the beam current density and the beam energy spread are key issues for this application. The energy spectra of self-extracted Au- beams from the source were measured under the condition of a constant work function of the production surface. The FWHM increases from 3 to 9 eV monotonically as the target voltage increases from 50 to 300 V, independently from the target surface work function of 2.2-3 eV.

Original languageEnglish
Pages (from-to)2726-2728
Number of pages3
JournalReview of Scientific Instruments
Volume63
Issue number4
DOIs
Publication statusPublished - Dec 1 1992

Fingerprint

plasma potentials
Ion sources
Heavy ions
negative ions
ion sources
heavy ions
Negative ions
Plasmas
Full width at half maximum
beam currents
energy spectra
Current density
Fusion reactions
fusion
current density
Electric potential
electric potential
energy

All Science Journal Classification (ASJC) codes

  • Instrumentation

Cite this

Development of negative heavy ion sources for plasma potential measurement. / Sasao, M.; Okabe, Y.; fujisawa, akihide; Fujita, J.; Yamaoka, H.; Wada, M.

In: Review of Scientific Instruments, Vol. 63, No. 4, 01.12.1992, p. 2726-2728.

Research output: Contribution to journalArticle

Sasao, M. ; Okabe, Y. ; fujisawa, akihide ; Fujita, J. ; Yamaoka, H. ; Wada, M. / Development of negative heavy ion sources for plasma potential measurement. In: Review of Scientific Instruments. 1992 ; Vol. 63, No. 4. pp. 2726-2728.
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