TY - GEN
T1 - Development of novel groove patterns for CMP pad
AU - Yamazaki, Tsutomu
AU - Doi, Toshiro K.
AU - Kurokawa, Syuhei
AU - Ohnishi, Osamu
AU - Uneda, Michio
AU - Seshimo, Kiyoshi
AU - Aida, Hideo
PY - 2012/4/30
Y1 - 2012/4/30
N2 - This study aims to develop the CMP pads that have new groove pattern as control the slurry flow. We have been proposed two type groove patterns as inflow type and outflow type. Here, it is well known that the slurry flow is remarkably important as both to use the slurry effectively and to reduction the slurry quantity consumed of CeO 2 abrasive that is one of rare metals. This paper describes the effect of groove pattern on the slurry flow from the observation image with high-speed camera. In particular, the slurry flow is quantitatively visualized by digital image processing. As a result, the several advantages of both proposed inflow type and outflow type show from a view point of slurry flow compared to the conventional XY-groove pad and No-groove pad.
AB - This study aims to develop the CMP pads that have new groove pattern as control the slurry flow. We have been proposed two type groove patterns as inflow type and outflow type. Here, it is well known that the slurry flow is remarkably important as both to use the slurry effectively and to reduction the slurry quantity consumed of CeO 2 abrasive that is one of rare metals. This paper describes the effect of groove pattern on the slurry flow from the observation image with high-speed camera. In particular, the slurry flow is quantitatively visualized by digital image processing. As a result, the several advantages of both proposed inflow type and outflow type show from a view point of slurry flow compared to the conventional XY-groove pad and No-groove pad.
UR - http://www.scopus.com/inward/record.url?scp=84860176881&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84860176881&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/AMR.497.264
DO - 10.4028/www.scientific.net/AMR.497.264
M3 - Conference contribution
AN - SCOPUS:84860176881
SN - 9783037853962
T3 - Advanced Materials Research
SP - 264
EP - 267
BT - Ultra-Precision Machining Technologies
T2 - 8th CHINA-JAPAN International Conference on Ultra-Precision Machining, CJUPM 2011
Y2 - 20 November 2011 through 22 November 2011
ER -