Development of ZnO-based surface plasmon resonance gas sensor and analysis of UV irradiation effect on NO2 desorption from ZnO thin films

Ken Watanabe, Kenji Matsumoto, Takeshi Ohgaki, Isao Sakaguchi, Naoki Ohashi, Shunichi Hishita, Hajime Haneda

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

In order to perform a high throughput exploration of sensor materials using surface plasmon resonance (SPR), the gas sensing property of a ZnO/Au/SiO 2 chip with SPR and the enhancing effect of UV irradiation on the desorption rate of NO2 from the ZnO surface were investigated. When the ZnO/Au/SiO2 chip was exposed to a high concentration of NO 2 (1000 ppm), a large peak shift was observed in the SPR curve. However, this sensing signal for NO2 gas did not recover to the baseline. In the case of low-concentration NO2 (10 ppm), the peak shift of the SPR curve was lower than that in the case of the high-concentration gas, but recovery to the baseline was observed. From the X-ray photoelectron spectra for N 1s of the ZnO thin films exposed to 1000- and 10-ppm NO 2, two chemisorption states-NO2- (403.7 eV) and NO3- (407 eV)-were confirmed. After the ZnO film was irradiated by UV rays, exposed to 10-ppm NO2, all peaks related to N 1s disappeared. However, in the case of the ZnO film exposed to 1000-ppm NO 2, adsorbed NO3- remained on the surface of ZnO. From these results, it was found that UV irradiation effectively assisted NO2 desorption from the surface of the ZnO thin film exposed to 10-ppm NO2.

Original languageEnglish
Pages (from-to)193-196
Number of pages4
JournalJournal of the Ceramic Society of Japan
Volume118
Issue number1375
DOIs
Publication statusPublished - Mar 2010
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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